EUV-mirror, optical system with EUV-mirror and associated operating method

U. Dinger (Inventor), Frederik Bijkerk (Inventor), Muharrem Bayraktar (Inventor), O. Dier (Inventor)

Research output: PatentProfessional

Abstract

An EUV mirror (1000) has a mirror element which forms a mirror surface of the mirror. The mirror element has a substrate (1020) and a multilayer arrangement (1030) applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV). The multilayer arrangement has a multiplicity of layer pairs having alternate layers composed of a high refractive index layer material and a low refractive index layer material, has an active layer (1040) arranged between a radiation entrance surface and the substrate and consisting of a piezoelectrically active layer material, the layer thickness (z) of which active layer can be altered by the action of an electric field, and has an electrode arrangement to generate the electric field acting on the active layer.
Original languageEnglish
Patent numberUS201615262272 20160912
Priority date21/03/12
Publication statusSubmitted - 29 Dec 2016

Fingerprint

mirrors
refractivity
electric fields
radiation
entrances
electrodes

Keywords

  • METIS-320142
  • IR-102804

Cite this

Dinger, U., Bijkerk, F., Bayraktar, M., & Dier, O. (2016). EUV-mirror, optical system with EUV-mirror and associated operating method. Manuscript submitted for publication. (Patent No. US201615262272 20160912).
@misc{1b0fda9108c04c42a0544191db143df7,
title = "EUV-mirror, optical system with EUV-mirror and associated operating method",
abstract = "An EUV mirror (1000) has a mirror element which forms a mirror surface of the mirror. The mirror element has a substrate (1020) and a multilayer arrangement (1030) applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV). The multilayer arrangement has a multiplicity of layer pairs having alternate layers composed of a high refractive index layer material and a low refractive index layer material, has an active layer (1040) arranged between a radiation entrance surface and the substrate and consisting of a piezoelectrically active layer material, the layer thickness (z) of which active layer can be altered by the action of an electric field, and has an electrode arrangement to generate the electric field acting on the active layer.",
keywords = "METIS-320142, IR-102804",
author = "U. Dinger and Frederik Bijkerk and Muharrem Bayraktar and O. Dier",
year = "2016",
month = "12",
day = "29",
language = "English",
type = "Patent",
note = "US201615262272 20160912",

}

EUV-mirror, optical system with EUV-mirror and associated operating method. / Dinger, U. (Inventor); Bijkerk, Frederik (Inventor); Bayraktar, Muharrem (Inventor); Dier, O. (Inventor).

Patent No.: US201615262272 20160912.

Research output: PatentProfessional

TY - PAT

T1 - EUV-mirror, optical system with EUV-mirror and associated operating method

AU - Dinger, U.

AU - Bijkerk, Frederik

AU - Bayraktar, Muharrem

AU - Dier, O.

PY - 2016/12/29

Y1 - 2016/12/29

N2 - An EUV mirror (1000) has a mirror element which forms a mirror surface of the mirror. The mirror element has a substrate (1020) and a multilayer arrangement (1030) applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV). The multilayer arrangement has a multiplicity of layer pairs having alternate layers composed of a high refractive index layer material and a low refractive index layer material, has an active layer (1040) arranged between a radiation entrance surface and the substrate and consisting of a piezoelectrically active layer material, the layer thickness (z) of which active layer can be altered by the action of an electric field, and has an electrode arrangement to generate the electric field acting on the active layer.

AB - An EUV mirror (1000) has a mirror element which forms a mirror surface of the mirror. The mirror element has a substrate (1020) and a multilayer arrangement (1030) applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV). The multilayer arrangement has a multiplicity of layer pairs having alternate layers composed of a high refractive index layer material and a low refractive index layer material, has an active layer (1040) arranged between a radiation entrance surface and the substrate and consisting of a piezoelectrically active layer material, the layer thickness (z) of which active layer can be altered by the action of an electric field, and has an electrode arrangement to generate the electric field acting on the active layer.

KW - METIS-320142

KW - IR-102804

M3 - Patent

M1 - US201615262272 20160912

ER -

Dinger U, Bijkerk F, Bayraktar M, Dier O, inventors. EUV-mirror, optical system with EUV-mirror and associated operating method. US201615262272 20160912. 2016 Dec 29.