EUV-multilayer coating of IR-eliminating reflection gratings

Research output: Contribution to conference › Poster › Other research output

Original language	Undefined
Pages	-
Publication status	Published - 21 Feb 2010
Event	SPIE Advanced Lithography 2010 - San Jose Convention Center, San Jose, United States Duration: 21 Feb 2010 → 26 Feb 2010 https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/advanced-lithography-2010

Conference	SPIE Advanced Lithography 2010
Country/Territory	United States
City	San Jose
Period	21/02/10 → 26/02/10
Internet address	https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/advanced-lithography-2010

Keywords

@conference{8cfee540b8b54b7c91dd636d0d5d48ed,

title = "EUV-multilayer coating of IR-eliminating reflection gratings",

keywords = "METIS-265557",

author = "\{van den Boogaard\}, Toine and Eric Louis and \{van Goor\}, F.A. and Frederik Bijkerk",

year = "2010",

month = feb,

day = "21",

language = "Undefined",

pages = "--",

note = "SPIE Advanced Lithography 2010 ; Conference date: 21-02-2010 Through 26-02-2010",

url = "https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/advanced-lithography-2010",

}