EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror

Qiushi Huang (Inventor), Eric Louis (Inventor), Frederik Bijkerk (Inventor), Meint J. de Boer (Inventor), G. von Blanckenhagen (Inventor)

Research output: PatentProfessional

Abstract

A multilayer mirror (M) reflecting extreme ultraviolet (EUV) radiation from a first wave-length range in a EUV spectral region comprises a substrate (SUB) and a stack of layers (SL) on the substrate, the stack of layers comprising layers comprising a low index material and a high index material, the low index material having a lower real part of the refractive index than the high index material at a given operating wavelength in the first wavelength range. The stack of layers further comprises a spectral purity filter on top of the stack of layers, the spectral purity filter effective as an anti-reflection layer for ultraviolet (UV) radiation from a second wavelength range in a UV spectral region to increase a EUV-UV-reflectivity ratio of the multilayer mirror. The spectral purity filter (SPF) comprises a non-diffracting graded-index anti-reflection layer (GI-AR) effective to reduce reflectivity in the second wavelength range.
Original languageEnglish
Patent numberWO2015EP52767 20150210
Priority date10/02/15
Publication statusSubmitted - 18 Aug 2016

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manufacturing
mirrors
purity
filters
wavelengths
extreme ultraviolet radiation
reflectance
ultraviolet radiation
refractivity

Keywords

  • METIS-320152

Cite this

Huang, Q., Louis, E., Bijkerk, F., de Boer, M. J., & von Blanckenhagen, G. (2016). EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror. Manuscript submitted for publication. (Patent No. WO2015EP52767 20150210).
Huang, Qiushi (Inventor) ; Louis, Eric (Inventor) ; Bijkerk, Frederik (Inventor) ; de Boer, Meint J. (Inventor) ; von Blanckenhagen, G. (Inventor). / EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror. Patent No.: WO2015EP52767 20150210.
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abstract = "A multilayer mirror (M) reflecting extreme ultraviolet (EUV) radiation from a first wave-length range in a EUV spectral region comprises a substrate (SUB) and a stack of layers (SL) on the substrate, the stack of layers comprising layers comprising a low index material and a high index material, the low index material having a lower real part of the refractive index than the high index material at a given operating wavelength in the first wavelength range. The stack of layers further comprises a spectral purity filter on top of the stack of layers, the spectral purity filter effective as an anti-reflection layer for ultraviolet (UV) radiation from a second wavelength range in a UV spectral region to increase a EUV-UV-reflectivity ratio of the multilayer mirror. The spectral purity filter (SPF) comprises a non-diffracting graded-index anti-reflection layer (GI-AR) effective to reduce reflectivity in the second wavelength range.",
keywords = "METIS-320152",
author = "Qiushi Huang and Eric Louis and Frederik Bijkerk and {de Boer}, {Meint J.} and {von Blanckenhagen}, G.",
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EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror. / Huang, Qiushi (Inventor); Louis, Eric (Inventor); Bijkerk, Frederik (Inventor); de Boer, Meint J. (Inventor); von Blanckenhagen, G. (Inventor).

Patent No.: WO2015EP52767 20150210.

Research output: PatentProfessional

TY - PAT

T1 - EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror

AU - Huang, Qiushi

AU - Louis, Eric

AU - Bijkerk, Frederik

AU - de Boer, Meint J.

AU - von Blanckenhagen, G.

PY - 2016/8/18

Y1 - 2016/8/18

N2 - A multilayer mirror (M) reflecting extreme ultraviolet (EUV) radiation from a first wave-length range in a EUV spectral region comprises a substrate (SUB) and a stack of layers (SL) on the substrate, the stack of layers comprising layers comprising a low index material and a high index material, the low index material having a lower real part of the refractive index than the high index material at a given operating wavelength in the first wavelength range. The stack of layers further comprises a spectral purity filter on top of the stack of layers, the spectral purity filter effective as an anti-reflection layer for ultraviolet (UV) radiation from a second wavelength range in a UV spectral region to increase a EUV-UV-reflectivity ratio of the multilayer mirror. The spectral purity filter (SPF) comprises a non-diffracting graded-index anti-reflection layer (GI-AR) effective to reduce reflectivity in the second wavelength range.

AB - A multilayer mirror (M) reflecting extreme ultraviolet (EUV) radiation from a first wave-length range in a EUV spectral region comprises a substrate (SUB) and a stack of layers (SL) on the substrate, the stack of layers comprising layers comprising a low index material and a high index material, the low index material having a lower real part of the refractive index than the high index material at a given operating wavelength in the first wavelength range. The stack of layers further comprises a spectral purity filter on top of the stack of layers, the spectral purity filter effective as an anti-reflection layer for ultraviolet (UV) radiation from a second wavelength range in a UV spectral region to increase a EUV-UV-reflectivity ratio of the multilayer mirror. The spectral purity filter (SPF) comprises a non-diffracting graded-index anti-reflection layer (GI-AR) effective to reduce reflectivity in the second wavelength range.

KW - METIS-320152

M3 - Patent

M1 - WO2015EP52767 20150210

ER -

Huang Q, Louis E, Bijkerk F, de Boer MJ, von Blanckenhagen G, inventors. EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror. WO2015EP52767 20150210. 2016 Aug 18.