Abstract
In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 μm). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources
Original language | English |
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Title of host publication | Extreme Ultraviolet (EUV) Lithography |
Subtitle of host publication | 22–25 February 2010, San Jose, California, United States |
Editors | Bruno M. La Fontaine |
Place of Publication | San Jose, CA, USA |
Publisher | SPIE |
Number of pages | 5 |
ISBN (Print) | 9780819480507 |
DOIs | |
Publication status | Published - 2010 |
Event | SPIE Conference on Extreme Ultraviolet (EUV) Lithography I, 2010 - San Jose, United States Duration: 22 Feb 2010 → 25 Feb 2010 Conference number: 1 |
Publication series
Name | Proceedings of SPIE |
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Publisher | SPIE |
Volume | 7636 |
ISSN (Print) | 0277-786X |
Conference
Conference | SPIE Conference on Extreme Ultraviolet (EUV) Lithography I, 2010 |
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Country/Territory | United States |
City | San Jose |
Period | 22/02/10 → 25/02/10 |