EUV-multilayers on grating-like topographies

Toine van den Boogaard; Eric Louis; K.A. Goldberg; I. Mochi; Frederik Bijkerk

doi:10.1117/12.846564

EUV-multilayers on grating-like topographies

Toine van den Boogaard, Eric Louis, K.A. Goldberg, I. Mochi, Frederik Bijkerk

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 μm). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources

Original language	English
Title of host publication	Extreme Ultraviolet (EUV) Lithography
Subtitle of host publication	22–25 February 2010, San Jose, California, United States
Editors	Bruno M. La Fontaine
Place of Publication	San Jose, CA, USA
Publisher	SPIE - The International Society for Optical Engineering
Number of pages	5
ISBN (Print)	9780819480507
DOIs	https://doi.org/10.1117/12.846564
Publication status	Published - 2010
Event	SPIE Conference on Extreme Ultraviolet (EUV) Lithography I, 2010 - San Jose, United States Duration: 22 Feb 2010 → 25 Feb 2010 Conference number: 1

Publication series

Name	Proceedings of SPIE
Publisher	SPIE
Volume	7636
ISSN (Print)	0277-786X

Conference

Conference	SPIE Conference on Extreme Ultraviolet (EUV) Lithography I, 2010
Country	United States
City	San Jose
Period	22/02/10 → 25/02/10

Access to Document

10.1117/12.846564

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van den Boogaard, T., Louis, E., Goldberg, K. A., Mochi, I., & Bijkerk, F. (2010). EUV-multilayers on grating-like topographies. In B. M. La Fontaine (Ed.), Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States (Proceedings of SPIE; Vol. 7636). San Jose, CA, USA: SPIE - The International Society for Optical Engineering. https://doi.org/10.1117/12.846564

van den Boogaard, Toine ; Louis, Eric ; Goldberg, K.A. ; Mochi, I. ; Bijkerk, Frederik. / EUV-multilayers on grating-like topographies. Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States. editor / Bruno M. La Fontaine. San Jose, CA, USA : SPIE - The International Society for Optical Engineering, 2010. (Proceedings of SPIE).

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title = "EUV-multilayers on grating-like topographies",

abstract = "In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 μm). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources",

author = "{van den Boogaard}, Toine and Eric Louis and K.A. Goldberg and I. Mochi and Frederik Bijkerk",

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language = "English",

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booktitle = "Extreme Ultraviolet (EUV) Lithography",

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van den Boogaard, T, Louis, E, Goldberg, KA, Mochi, I & Bijkerk, F 2010, EUV-multilayers on grating-like topographies. in BM La Fontaine (ed.), Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States. Proceedings of SPIE, vol. 7636, SPIE - The International Society for Optical Engineering, San Jose, CA, USA, SPIE Conference on Extreme Ultraviolet (EUV) Lithography I, 2010, San Jose, United States, 22/02/10. https://doi.org/10.1117/12.846564

EUV-multilayers on grating-like topographies. / van den Boogaard, Toine; Louis, Eric; Goldberg, K.A.; Mochi, I.; Bijkerk, Frederik.

Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States. ed. / Bruno M. La Fontaine. San Jose, CA, USA : SPIE - The International Society for Optical Engineering, 2010. (Proceedings of SPIE; Vol. 7636).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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T1 - EUV-multilayers on grating-like topographies

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AU - Louis, Eric

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AU - Mochi, I.

AU - Bijkerk, Frederik

PY - 2010

Y1 - 2010

N2 - In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 μm). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources

AB - In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 μm). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources

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DO - 10.1117/12.846564

M3 - Conference contribution

SN - 9780819480507

T3 - Proceedings of SPIE

BT - Extreme Ultraviolet (EUV) Lithography

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van den Boogaard T, Louis E, Goldberg KA, Mochi I, Bijkerk F. EUV-multilayers on grating-like topographies. In La Fontaine BM, editor, Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States. San Jose, CA, USA: SPIE - The International Society for Optical Engineering. 2010. (Proceedings of SPIE). https://doi.org/10.1117/12.846564