EUV-multilayers on grating-like topographies

Toine van den Boogaard, Eric Louis, K.A. Goldberg, I. Mochi, Frederik Bijkerk

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 μm). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources
Original languageEnglish
Title of host publicationExtreme Ultraviolet (EUV) Lithography
Subtitle of host publication22–25 February 2010, San Jose, California, United States
EditorsBruno M. La Fontaine
Place of PublicationSan Jose, CA, USA
PublisherSPIE - The International Society for Optical Engineering
Number of pages5
ISBN (Print)9780819480507
DOIs
Publication statusPublished - 2010
EventSPIE Conference on Extreme Ultraviolet (EUV) Lithography I, 2010 - San Jose, United States
Duration: 22 Feb 201025 Feb 2010
Conference number: 1

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume7636
ISSN (Print)0277-786X

Conference

ConferenceSPIE Conference on Extreme Ultraviolet (EUV) Lithography I, 2010
CountryUnited States
CitySan Jose
Period22/02/1025/02/10

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  • Cite this

    van den Boogaard, T., Louis, E., Goldberg, K. A., Mochi, I., & Bijkerk, F. (2010). EUV-multilayers on grating-like topographies. In B. M. La Fontaine (Ed.), Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States (Proceedings of SPIE; Vol. 7636). San Jose, CA, USA: SPIE - The International Society for Optical Engineering. https://doi.org/10.1117/12.846564