Abstract
In this chapter, a survey of selected metrology tools for EUV photon sources is presented. Section 13.2 discusses absolutely calibrated measurement of the in-band energy with a photodiode that is combined with a multilayer mirror acting as the band limiting element. Another narrowband metrology approach based on anomalous transmission is presented as a compact alternative. In Section 13.3, literature on spectroscopy for the EUV sources is surveyed, and a transmission grating spectrometer based on a set of high-line-density freestanding gratings is introduced for broadband spectroscopy. The spectral characteristics of HHG, DPP, and LPP sources, including industrial EUV sources, characterized by the transmission grating spectrometer, are discussed.
Original language | English |
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Title of host publication | Photon Sources for Lithography and Metrology |
Editors | Vivek Bakshi |
Chapter | 13 |
Pages | 509-535 |
DOIs | |
Publication status | Published - 22 Sept 2023 |
Keywords
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