EUV Source Metrology

Muharrem Bayraktar*, Fei Liu, Oscar Versolato, F. Bijkerk

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingChapterAcademicpeer-review

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Abstract


In this chapter, a survey of selected metrology tools for EUV photon sources is presented. Section 13.2 discusses absolutely calibrated measurement of the in-band energy with a photodiode that is combined with a multilayer mirror acting as the band limiting element. Another narrowband metrology approach based on anomalous transmission is presented as a compact alternative. In Section 13.3, literature on spectroscopy for the EUV sources is surveyed, and a transmission grating spectrometer based on a set of high-line-density freestanding gratings is introduced for broadband spectroscopy. The spectral characteristics of HHG, DPP, and LPP sources, including industrial EUV sources, characterized by the transmission grating spectrometer, are discussed.
Original languageEnglish
Title of host publicationPhoton Sources for Lithography and Metrology
EditorsVivek Bakshi
Chapter13
Pages509-535
DOIs
Publication statusPublished - 22 Sept 2023

Keywords

  • 2023 OA procedure

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