TY - GEN
T1 - Experimental results obtained in the vibrating intrinsic reverberation chamber
AU - Leferink, Frank Bernardus Johannes
AU - Boudenot, Jean-Claude
AU - van Etten, Wim
PY - 2000/8/21
Y1 - 2000/8/21
N2 - Measurements have been performed in a vibrating intrinsic reverberation chamber (VIRC). This chamber has varying angles between wall, floor and ceiling. Inside the VIRC a diffuse, statistically uniform electromagnetic field is created without the use of a mechanical rotating mode stirrer. In comparison to other reverberation chambers the VIRC displays an improved low frequency behavior, enabling faster, cost effective testing and allows for in-situ measurements. Several measurement results obtained in the VIRC are presented in this paper, such as the change in resonance frequency, the stirring ratio and the power density function.
AB - Measurements have been performed in a vibrating intrinsic reverberation chamber (VIRC). This chamber has varying angles between wall, floor and ceiling. Inside the VIRC a diffuse, statistically uniform electromagnetic field is created without the use of a mechanical rotating mode stirrer. In comparison to other reverberation chambers the VIRC displays an improved low frequency behavior, enabling faster, cost effective testing and allows for in-situ measurements. Several measurement results obtained in the VIRC are presented in this paper, such as the change in resonance frequency, the stirring ratio and the power density function.
KW - Vibration measurement
KW - METIS-113231
KW - Performance Evaluation
KW - Testing
KW - Floors
KW - IR-101670
KW - Electromagnetic fields
KW - Electromagnetic measurements
KW - Reverberation chamber
KW - Costs
KW - Displays
KW - Frequency measurement
U2 - 10.1109/ISEMC.2000.874695
DO - 10.1109/ISEMC.2000.874695
M3 - Conference contribution
SN - 0-7803-5677-2
SP - 639
EP - 644
BT - 2000 IEEE international Symposium on Electromagnetic Compatibility
PB - IEEE
CY - Washington, DC, USA
T2 - 2000 IEEE International Symposium on Electromagnetic Compatibility, EMC 2000
Y2 - 21 August 2000 through 25 August 2000
ER -