Exploring microstencils for sub-micron patterning using pulsed laser deposition

F. Vroegindeweij; E.A. Speets; J.A.J. Steen; J.P. Brugger; David H.A. Blank

doi:10.1007/s00339-004-2749-0

Exploring microstencils for sub-micron patterning using pulsed laser deposition

F. Vroegindeweij, E.A. Speets, J.A.J. Steen, J.P. Brugger, David H.A. Blank

Research output: Contribution to journal › Article › Academic › peer-review

26 Citations (Scopus)

Abstract

The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 um down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.

Original language	English
Pages (from-to)	743-745
Number of pages	3
Journal	Applied physics A: Materials science and processing
Volume	79
Issue number	4-6
DOIs	https://doi.org/10.1007/s00339-004-2749-0
Publication status	Published - 2004

Keywords

IR-47734
METIS-218580

Access to Document

10.1007/s00339-004-2749-0

Cite this

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title = "Exploring microstencils for sub-micron patterning using pulsed laser deposition",

abstract = "The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 um down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.",

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AU - Vroegindeweij, F.

AU - Speets, E.A.

AU - Steen, J.A.J.

AU - Brugger, J.P.

AU - Blank, David H.A.

PY - 2004

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N2 - The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 um down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.

AB - The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 um down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.

KW - IR-47734

KW - METIS-218580

U2 - 10.1007/s00339-004-2749-0

DO - 10.1007/s00339-004-2749-0

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