Exploring microstencils for sub-micron patterning using pulsed laser deposition

F. Vroegindeweij; E.A. Speets; J.A.J. Steen; J.P. Brugger; D.H.A. Blank

doi:10.1007/s00339-004-2749-0

Exploring microstencils for sub-micron patterning using pulsed laser deposition

F. Vroegindeweij, E.A. Speets, J.A.J. Steen, J.P. Brugger, D.H.A. Blank

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Abstract

The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 um down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.

Original language	English
Pages (from-to)	743-745
Number of pages	3
Journal	Applied physics A: Materials science and processing
Volume	79
Issue number	4-6
DOIs	https://doi.org/10.1007/s00339-004-2749-0
Publication status	Published - 2004

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@article{25d3514752754b648ec4460517d082fe,

title = "Exploring microstencils for sub-micron patterning using pulsed laser deposition",

abstract = "The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 um down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.",

keywords = "n/a OA procedure",

author = "F. Vroegindeweij and E.A. Speets and J.A.J. Steen and J.P. Brugger and D.H.A. Blank",

year = "2004",

doi = "10.1007/s00339-004-2749-0",

language = "English",

volume = "79",

pages = "743--745",

journal = "Applied physics A: Materials science and processing",

issn = "0947-8396",

publisher = "Springer",

number = "4-6",

}

TY - JOUR

T1 - Exploring microstencils for sub-micron patterning using pulsed laser deposition

AU - Vroegindeweij, F.

AU - Speets, E.A.

AU - Steen, J.A.J.

AU - Brugger, J.P.

AU - Blank, D.H.A.

PY - 2004

Y1 - 2004

N2 - The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 um down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.

AB - The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 um down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.

KW - n/a OA procedure

U2 - 10.1007/s00339-004-2749-0

DO - 10.1007/s00339-004-2749-0

M3 - Article

SN - 0947-8396

VL - 79

SP - 743

EP - 745

JO - Applied physics A: Materials science and processing

JF - Applied physics A: Materials science and processing

IS - 4-6

ER -

Exploring microstencils for sub-micron patterning using pulsed laser deposition

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