Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen

Dmitry Astakhov, W.J. Goedheer, Christopher James Lee, V.V. Ivanov, V.M. Krivtsun, K.N. Koshelev, D.V. Lopaev, R.M. Horst, J. Beckers, E.A. Osorio, Frederik Bijkerk

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Abstract

We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.
Original languageEnglish
Article number295204
Pages (from-to)-
Number of pages9
JournalJournal of physics D: applied physics
Volume49
Issue number29
DOIs
Publication statusPublished - 2016

Fingerprint

Argon
Carrier concentration
Hydrogen
argon
Plasmas
Radiation
hydrogen
radiation
Secondary emission
cavities
secondary emission
Microwaves
Spectroscopy
microwaves
Geometry
geometry
spectroscopy
simulation

Keywords

  • IR-102013
  • METIS-318734

Cite this

Astakhov, Dmitry ; Goedheer, W.J. ; Lee, Christopher James ; Ivanov, V.V. ; Krivtsun, V.M. ; Koshelev, K.N. ; Lopaev, D.V. ; Horst, R.M. ; Beckers, J. ; Osorio, E.A. ; Bijkerk, Frederik. / Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen. In: Journal of physics D: applied physics. 2016 ; Vol. 49, No. 29. pp. -.
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abstract = "We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.",
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Astakhov, D, Goedheer, WJ, Lee, CJ, Ivanov, VV, Krivtsun, VM, Koshelev, KN, Lopaev, DV, Horst, RM, Beckers, J, Osorio, EA & Bijkerk, F 2016, 'Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen' Journal of physics D: applied physics, vol. 49, no. 29, 295204, pp. -. https://doi.org/10.1088/0022-3727/49/29/295204

Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen. / Astakhov, Dmitry; Goedheer, W.J.; Lee, Christopher James; Ivanov, V.V.; Krivtsun, V.M.; Koshelev, K.N.; Lopaev, D.V.; Horst, R.M.; Beckers, J.; Osorio, E.A.; Bijkerk, Frederik.

In: Journal of physics D: applied physics, Vol. 49, No. 29, 295204, 2016, p. -.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen

AU - Astakhov, Dmitry

AU - Goedheer, W.J.

AU - Lee, Christopher James

AU - Ivanov, V.V.

AU - Krivtsun, V.M.

AU - Koshelev, K.N.

AU - Lopaev, D.V.

AU - Horst, R.M.

AU - Beckers, J.

AU - Osorio, E.A.

AU - Bijkerk, Frederik

PY - 2016

Y1 - 2016

N2 - We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.

AB - We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.

KW - IR-102013

KW - METIS-318734

U2 - 10.1088/0022-3727/49/29/295204

DO - 10.1088/0022-3727/49/29/295204

M3 - Article

VL - 49

SP - -

JO - Journal of physics D: applied physics

JF - Journal of physics D: applied physics

SN - 0022-3727

IS - 29

M1 - 295204

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