Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen

Dmitry Astakhov, W.J. Goedheer, Christopher James Lee, V.V. Ivanov, V.M. Krivtsun, K.N. Koshelev, D.V. Lopaev, R.M. Horst, J. Beckers, E.A. Osorio, Frederik Bijkerk

Research output: Contribution to journalArticleAcademicpeer-review

17 Citations (Scopus)

Abstract

We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.
Original languageEnglish
Article number295204
Pages (from-to)-
Number of pages9
JournalJournal of physics D: applied physics
Volume49
Issue number29
DOIs
Publication statusPublished - 2016

Keywords

  • IR-102013
  • METIS-318734

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