Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties

Viacheslav Medvedev, Andrey Yakshin, Eric Louis, Robbert Wilhelmus Elisabeth van de Kruijs, Toine van den Boogaard, V.M. Krivtsun, A.M. Yakinun, Frederik Bijkerk

Research output: Contribution to conferencePosterOther research output

Abstract

Many optical applications demand high reflectivity in a particular wavelength range while simultaneously requiring suppression of radiation outside this range. Such parasitic radiation can for instance lead to image distortions in imaging applications or poor signal-noise ratios in spectroscopy. The most obvious need for radiation with high “spectral purity” can be found in extreme UV lithography (EUVL). EUVL utilizes narrow-band (13.5 nm ± 1%) radiation being extracted from a broad-band spectrum emitted by dense hot plasma sources. For this purpose we proposed and investigated various methods to integrate EUV reflecting multilayers with resonant infrared anti-reflecting structures. We discuss our pilot experiments, physics and optical properties of the realized structures in broad spectral range – from the EUV up to the infrared ranges.
Original languageUndefined
Pages-
Publication statusPublished - 22 Jan 2013
EventPhysics@FOM Veldhoven 2013 - NH Koningshof, Veldhoven, Netherlands
Duration: 22 Jan 201323 Jan 2013
https://www.nwo-i.nl/agenda/physicsatveldhoven/archives/

Conference

ConferencePhysics@FOM Veldhoven 2013
CountryNetherlands
CityVeldhoven
Period22/01/1323/01/13
Internet address

Keywords

  • METIS-299687

Cite this

Medvedev, V., Yakshin, A., Louis, E., van de Kruijs, R. W. E., van den Boogaard, T., Krivtsun, V. M., ... Bijkerk, F. (2013). Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties. -. Poster session presented at Physics@FOM Veldhoven 2013, Veldhoven, Netherlands.
Medvedev, Viacheslav ; Yakshin, Andrey ; Louis, Eric ; van de Kruijs, Robbert Wilhelmus Elisabeth ; van den Boogaard, Toine ; Krivtsun, V.M. ; Yakinun, A.M. ; Bijkerk, Frederik. / Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties. Poster session presented at Physics@FOM Veldhoven 2013, Veldhoven, Netherlands.
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title = "Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties",
abstract = "Many optical applications demand high reflectivity in a particular wavelength range while simultaneously requiring suppression of radiation outside this range. Such parasitic radiation can for instance lead to image distortions in imaging applications or poor signal-noise ratios in spectroscopy. The most obvious need for radiation with high “spectral purity” can be found in extreme UV lithography (EUVL). EUVL utilizes narrow-band (13.5 nm ± 1{\%}) radiation being extracted from a broad-band spectrum emitted by dense hot plasma sources. For this purpose we proposed and investigated various methods to integrate EUV reflecting multilayers with resonant infrared anti-reflecting structures. We discuss our pilot experiments, physics and optical properties of the realized structures in broad spectral range – from the EUV up to the infrared ranges.",
keywords = "METIS-299687",
author = "Viacheslav Medvedev and Andrey Yakshin and Eric Louis and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and {van den Boogaard}, Toine and V.M. Krivtsun and A.M. Yakinun and Frederik Bijkerk",
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Medvedev, V, Yakshin, A, Louis, E, van de Kruijs, RWE, van den Boogaard, T, Krivtsun, VM, Yakinun, AM & Bijkerk, F 2013, 'Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties' Physics@FOM Veldhoven 2013, Veldhoven, Netherlands, 22/01/13 - 23/01/13, pp. -.

Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties. / Medvedev, Viacheslav; Yakshin, Andrey; Louis, Eric; van de Kruijs, Robbert Wilhelmus Elisabeth; van den Boogaard, Toine; Krivtsun, V.M.; Yakinun, A.M.; Bijkerk, Frederik.

2013. - Poster session presented at Physics@FOM Veldhoven 2013, Veldhoven, Netherlands.

Research output: Contribution to conferencePosterOther research output

TY - CONF

T1 - Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties

AU - Medvedev, Viacheslav

AU - Yakshin, Andrey

AU - Louis, Eric

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - van den Boogaard, Toine

AU - Krivtsun, V.M.

AU - Yakinun, A.M.

AU - Bijkerk, Frederik

PY - 2013/1/22

Y1 - 2013/1/22

N2 - Many optical applications demand high reflectivity in a particular wavelength range while simultaneously requiring suppression of radiation outside this range. Such parasitic radiation can for instance lead to image distortions in imaging applications or poor signal-noise ratios in spectroscopy. The most obvious need for radiation with high “spectral purity” can be found in extreme UV lithography (EUVL). EUVL utilizes narrow-band (13.5 nm ± 1%) radiation being extracted from a broad-band spectrum emitted by dense hot plasma sources. For this purpose we proposed and investigated various methods to integrate EUV reflecting multilayers with resonant infrared anti-reflecting structures. We discuss our pilot experiments, physics and optical properties of the realized structures in broad spectral range – from the EUV up to the infrared ranges.

AB - Many optical applications demand high reflectivity in a particular wavelength range while simultaneously requiring suppression of radiation outside this range. Such parasitic radiation can for instance lead to image distortions in imaging applications or poor signal-noise ratios in spectroscopy. The most obvious need for radiation with high “spectral purity” can be found in extreme UV lithography (EUVL). EUVL utilizes narrow-band (13.5 nm ± 1%) radiation being extracted from a broad-band spectrum emitted by dense hot plasma sources. For this purpose we proposed and investigated various methods to integrate EUV reflecting multilayers with resonant infrared anti-reflecting structures. We discuss our pilot experiments, physics and optical properties of the realized structures in broad spectral range – from the EUV up to the infrared ranges.

KW - METIS-299687

M3 - Poster

SP - -

ER -

Medvedev V, Yakshin A, Louis E, van de Kruijs RWE, van den Boogaard T, Krivtsun VM et al. Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties. 2013. Poster session presented at Physics@FOM Veldhoven 2013, Veldhoven, Netherlands.