Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties

Viacheslav Medvedev, Andrey Yakshin, Eric Louis, Robbert Wilhelmus Elisabeth van de Kruijs, Toine van den Boogaard, V.M. Krivtsun, A.M. Yakunin, Frederik Bijkerk

Research output: Contribution to conferencePosterOther research output


Many optical applications demand high reflectivity in a particular wavelength range while simultaneously requiring suppression of radiation outside this range. Such parasitic radiation can for instance lead to image distortions in imaging applications or poor signal-noise ratios in spectroscopy. The most obvious need for radiation with high “spectral purity” can be found in extreme UV lithography (EUVL). EUVL utilizes narrow-band (13.5 nm ± 1%) radiation being extracted from a broad-band spectrum emitted by dense hot plasma sources. For this purpose we proposed and investigated various methods to integrate EUV reflecting multilayers with resonant infrared anti-reflecting structures. We discuss our pilot experiments, physics and optical properties of the realized structures in broad spectral range – from the EUV up to the infrared ranges.
Original languageEnglish
Publication statusPublished - 22 Jan 2012
EventPhysics@FOM Veldhoven 2012: Tertiary Chemical interactions at the interfaces of Mo/B4C/Si/B4C multilayers upon low-temperature annealing - NH Koningshof Veldhoven, Veldhoven, Netherlands
Duration: 17 Jan 201218 Jan 2012


ConferencePhysics@FOM Veldhoven 2012


  • METIS-298892


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