Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001)

Feng Liu; Jacobus Marinus Sturm; E. Osorio; M. van Kampen; Christopher James Lee; Frederik Bijkerk

Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001)

Feng Liu, Jacobus Marinus Sturm, E. Osorio, M. van Kampen, Christopher James Lee, Frederik Bijkerk

XUV Optics

Research output: Contribution to conference › Poster

Abstract

Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We used temperature programmed desorption and reflection-absorption infrared spectroscopy in a UHV chamber to characterize the binding structure and changes in the chemical composition of molecular contamination layers on the surface. The photochemical reactions of water, hydrocarbons and hydrogen on Ru(0001) were studied. We found that the dissociation of water on Ru is enhanced by EUV radiation, which lead to oxidation of the Ru surface. Secondly, the dissociation of ethanol into CO, hydrogen and carbon was investigated. Additionally, experiments showed that hydrogen radicals can reduce the oxidized surface, which was analysed by a reaction model that includes EUV induced oxidation by water and reduction by hydrogen

Original language	Undefined
Pages	-
Publication status	Published - 22 Jan 2013
Event	Physics@FOM Veldhoven 2013 - NH Koningshof, Veldhoven, Netherlands Duration: 22 Jan 2013 → 23 Jan 2013 https://www.nwo-i.nl/agenda/physicsatveldhoven/archives/

Conference

Conference	Physics@FOM Veldhoven 2013
Country/Territory	Netherlands
City	Veldhoven
Period	22/01/13 → 23/01/13
Internet address	https://www.nwo-i.nl/agenda/physicsatveldhoven/archives/

Keywords

METIS-299676

Cite this

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title = "Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001)",

abstract = "Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We used temperature programmed desorption and reflection-absorption infrared spectroscopy in a UHV chamber to characterize the binding structure and changes in the chemical composition of molecular contamination layers on the surface. The photochemical reactions of water, hydrocarbons and hydrogen on Ru(0001) were studied. We found that the dissociation of water on Ru is enhanced by EUV radiation, which lead to oxidation of the Ru surface. Secondly, the dissociation of ethanol into CO, hydrogen and carbon was investigated. Additionally, experiments showed that hydrogen radicals can reduce the oxidized surface, which was analysed by a reaction model that includes EUV induced oxidation by water and reduction by hydrogen",

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author = "Feng Liu and Sturm, {Jacobus Marinus} and E. Osorio and {van Kampen}, M. and Lee, {Christopher James} and Frederik Bijkerk",

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TY - CONF

T1 - Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001)

AU - Liu, Feng

AU - Sturm, Jacobus Marinus

AU - Osorio, E.

AU - van Kampen, M.

AU - Lee, Christopher James

AU - Bijkerk, Frederik

PY - 2013/1/22

Y1 - 2013/1/22

N2 - Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We used temperature programmed desorption and reflection-absorption infrared spectroscopy in a UHV chamber to characterize the binding structure and changes in the chemical composition of molecular contamination layers on the surface. The photochemical reactions of water, hydrocarbons and hydrogen on Ru(0001) were studied. We found that the dissociation of water on Ru is enhanced by EUV radiation, which lead to oxidation of the Ru surface. Secondly, the dissociation of ethanol into CO, hydrogen and carbon was investigated. Additionally, experiments showed that hydrogen radicals can reduce the oxidized surface, which was analysed by a reaction model that includes EUV induced oxidation by water and reduction by hydrogen

AB - Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We used temperature programmed desorption and reflection-absorption infrared spectroscopy in a UHV chamber to characterize the binding structure and changes in the chemical composition of molecular contamination layers on the surface. The photochemical reactions of water, hydrocarbons and hydrogen on Ru(0001) were studied. We found that the dissociation of water on Ru is enhanced by EUV radiation, which lead to oxidation of the Ru surface. Secondly, the dissociation of ethanol into CO, hydrogen and carbon was investigated. Additionally, experiments showed that hydrogen radicals can reduce the oxidized surface, which was analysed by a reaction model that includes EUV induced oxidation by water and reduction by hydrogen

KW - METIS-299676

M3 - Poster

SP - -

Y2 - 22 January 2013 through 23 January 2013

ER -