Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001)

Feng Liu, Jacobus Marinus Sturm, E. Osorio, M. van Kampen, Christopher James Lee, Frederik Bijkerk

Research output: Contribution to conferencePosterOther research output

Abstract

Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We used temperature programmed desorption and reflection-absorption infrared spectroscopy in a UHV chamber to characterize the binding structure and changes in the chemical composition of molecular contamination layers on the surface. The photochemical reactions of water, hydrocarbons and hydrogen on Ru(0001) were studied. We found that the dissociation of water on Ru is enhanced by EUV radiation, which lead to oxidation of the Ru surface. Secondly, the dissociation of ethanol into CO, hydrogen and carbon was investigated. Additionally, experiments showed that hydrogen radicals can reduce the oxidized surface, which was analysed by a reaction model that includes EUV induced oxidation by water and reduction by hydrogen
Original languageUndefined
Pages-
Publication statusPublished - 22 Jan 2013
EventPhysics@FOM Veldhoven 2013 - NH Koningshof, Veldhoven, Netherlands
Duration: 22 Jan 201323 Jan 2013
https://www.nwo-i.nl/agenda/physicsatveldhoven/archives/

Conference

ConferencePhysics@FOM Veldhoven 2013
CountryNetherlands
CityVeldhoven
Period22/01/1323/01/13
Internet address

Keywords

  • METIS-299676

Cite this

Liu, F., Sturm, J. M., Osorio, E., van Kampen, M., Lee, C. J., & Bijkerk, F. (2013). Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001). -. Poster session presented at Physics@FOM Veldhoven 2013, Veldhoven, Netherlands.
Liu, Feng ; Sturm, Jacobus Marinus ; Osorio, E. ; van Kampen, M. ; Lee, Christopher James ; Bijkerk, Frederik. / Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001). Poster session presented at Physics@FOM Veldhoven 2013, Veldhoven, Netherlands.
@conference{73c6c20a2eae4542a0d3c960e20541f9,
title = "Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001)",
abstract = "Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We used temperature programmed desorption and reflection-absorption infrared spectroscopy in a UHV chamber to characterize the binding structure and changes in the chemical composition of molecular contamination layers on the surface. The photochemical reactions of water, hydrocarbons and hydrogen on Ru(0001) were studied. We found that the dissociation of water on Ru is enhanced by EUV radiation, which lead to oxidation of the Ru surface. Secondly, the dissociation of ethanol into CO, hydrogen and carbon was investigated. Additionally, experiments showed that hydrogen radicals can reduce the oxidized surface, which was analysed by a reaction model that includes EUV induced oxidation by water and reduction by hydrogen",
keywords = "METIS-299676",
author = "Feng Liu and Sturm, {Jacobus Marinus} and E. Osorio and {van Kampen}, M. and Lee, {Christopher James} and Frederik Bijkerk",
year = "2013",
month = "1",
day = "22",
language = "Undefined",
pages = "--",
note = "null ; Conference date: 22-01-2013 Through 23-01-2013",
url = "https://www.nwo-i.nl/agenda/physicsatveldhoven/archives/",

}

Liu, F, Sturm, JM, Osorio, E, van Kampen, M, Lee, CJ & Bijkerk, F 2013, 'Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001)' Physics@FOM Veldhoven 2013, Veldhoven, Netherlands, 22/01/13 - 23/01/13, pp. -.

Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001). / Liu, Feng; Sturm, Jacobus Marinus; Osorio, E.; van Kampen, M.; Lee, Christopher James; Bijkerk, Frederik.

2013. - Poster session presented at Physics@FOM Veldhoven 2013, Veldhoven, Netherlands.

Research output: Contribution to conferencePosterOther research output

TY - CONF

T1 - Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001)

AU - Liu, Feng

AU - Sturm, Jacobus Marinus

AU - Osorio, E.

AU - van Kampen, M.

AU - Lee, Christopher James

AU - Bijkerk, Frederik

PY - 2013/1/22

Y1 - 2013/1/22

N2 - Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We used temperature programmed desorption and reflection-absorption infrared spectroscopy in a UHV chamber to characterize the binding structure and changes in the chemical composition of molecular contamination layers on the surface. The photochemical reactions of water, hydrocarbons and hydrogen on Ru(0001) were studied. We found that the dissociation of water on Ru is enhanced by EUV radiation, which lead to oxidation of the Ru surface. Secondly, the dissociation of ethanol into CO, hydrogen and carbon was investigated. Additionally, experiments showed that hydrogen radicals can reduce the oxidized surface, which was analysed by a reaction model that includes EUV induced oxidation by water and reduction by hydrogen

AB - Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We used temperature programmed desorption and reflection-absorption infrared spectroscopy in a UHV chamber to characterize the binding structure and changes in the chemical composition of molecular contamination layers on the surface. The photochemical reactions of water, hydrocarbons and hydrogen on Ru(0001) were studied. We found that the dissociation of water on Ru is enhanced by EUV radiation, which lead to oxidation of the Ru surface. Secondly, the dissociation of ethanol into CO, hydrogen and carbon was investigated. Additionally, experiments showed that hydrogen radicals can reduce the oxidized surface, which was analysed by a reaction model that includes EUV induced oxidation by water and reduction by hydrogen

KW - METIS-299676

M3 - Poster

SP - -

ER -

Liu F, Sturm JM, Osorio E, van Kampen M, Lee CJ, Bijkerk F. Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001). 2013. Poster session presented at Physics@FOM Veldhoven 2013, Veldhoven, Netherlands.