Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001)

Feng Liu, Jacobus Marinus Sturm, E. Osorio, M. van Kampen, Christopher James Lee, Frederik Bijkerk

Research output: Contribution to conferencePosterOther research output


Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We used temperature programmed desorption and reflection-absorption infrared spectroscopy in a UHV chamber to characterize the binding structure and changes in the chemical composition of molecular contamination layers on the surface. The photochemical reactions of water, hydrocarbons and hydrogen on Ru(0001) were studied. We found that the dissociation of water on Ru is enhanced by EUV radiation, which lead to oxidation of the Ru surface. Secondly, the dissociation of ethanol into CO, hydrogen and carbon was investigated. Additionally, experiments showed that hydrogen radicals can reduce the oxidized surface, which was analysed by a reaction model that includes EUV induced oxidation by water and reduction by hydrogen
Original languageUndefined
Publication statusPublished - 22 Jan 2013
EventPhysics@FOM Veldhoven 2013 - NH Koningshof, Veldhoven, Netherlands
Duration: 22 Jan 201323 Jan 2013


ConferencePhysics@FOM Veldhoven 2013
Internet address


  • METIS-299676

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