Abstract
An experimental setup that directly reproduces extreme ultraviolet (EUV) lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an ultra-high vacuum experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas, are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed
Original language | English |
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Article number | 035003 |
Pages (from-to) | - |
Number of pages | 7 |
Journal | Plasma sources science and technology |
Volume | 24 |
Issue number | 3 |
DOIs | |
Publication status | Published - 29 Apr 2015 |
Keywords
- METIS-310344
- IR-95672