Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes

A. Dolgov*, O. Yakushev, A. Abrikosov, E. Snegirev, V.M. Krivtsun, C.J. Lee, F. Bijkerk

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

19 Citations (Scopus)
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An experimental setup that directly reproduces extreme ultraviolet (EUV) lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an ultra-high vacuum experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas, are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed.
Original languageEnglish
Article number035003
Number of pages7
JournalPlasma sources science and technology
Issue number3
Early online date29 Apr 2015
Publication statusPublished - May 2015


  • METIS-310344
  • IR-95672
  • extreme ultraviolet
  • EUV source
  • EUV-induced plasma
  • plasma probe
  • 2023 OA procedure


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