Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes

A. Dolgov; O. Yakushev; A. Abrikosov; E. Snegirev; V.M. Krivtsun; Christopher James Lee; Frederik Bijkerk

doi:10.1088/0963-0252/24/3/035003

Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes

A. Dolgov, O. Yakushev, A. Abrikosov, E. Snegirev, V.M. Krivtsun, Christopher James Lee, Frederik Bijkerk

Research output: Contribution to journal › Article › Academic › peer-review

14 Citations (Scopus)

Abstract

An experimental setup that directly reproduces extreme ultraviolet (EUV) lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an ultra-high vacuum experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas, are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed

Original language	English
Article number	035003
Pages (from-to)	-
Number of pages	7
Journal	Plasma sources science and technology
Volume	24
Issue number	3
DOIs	https://doi.org/10.1088/0963-0252/24/3/035003
Publication status	Published - 29 Apr 2015

Keywords

METIS-310344
IR-95672

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10.1088/0963-0252/24/3/035003

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title = "Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes",

abstract = "An experimental setup that directly reproduces extreme ultraviolet (EUV) lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an ultra-high vacuum experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas, are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed",

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Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes. / Dolgov, A.; Yakushev, O.; Abrikosov, A.; Snegirev, E.; Krivtsun, V.M.; Lee, Christopher James; Bijkerk, Frederik.

In: Plasma sources science and technology, Vol. 24, No. 3, 035003, 29.04.2015, p. -.

Research output: Contribution to journal › Article › Academic › peer-review

TY - JOUR

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AU - Dolgov, A.

AU - Yakushev, O.

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AU - Snegirev, E.

AU - Krivtsun, V.M.

AU - Lee, Christopher James

AU - Bijkerk, Frederik

PY - 2015/4/29

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DO - 10.1088/0963-0252/24/3/035003

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