Extreme UltraViolet lithography

Jos Benschop, Erik Loopstra

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

Extreme UltraViolet Lithography (EUVL), using 13.5 nm wavelength, all reflective optics and a vacuum environment, is the leading candidate to succeed immersion 193nm lithography to print features with sizes of 22 nm and below. Several major programs worldwide have matured this technology since the late 1980's. In 2006 ASML shipped the first Alpha Demo tools (NA=0.25 full field scanners) to IMEC in Belgium and CNSE in Albany, USA. Currently early production tools are being assembled. After a short introduction into IC fabrication, and the role of lithography, it will be explained why EUVL will be used to enable Moore's Law in a cost effective way. A brief history of EUVL will be followed by latest results obtained with the Alpha Demo tools. Status of the integration of the early production tools will be shared including an update on critical tool related issues including the EUV source. Finally the future technology roadmap will be shared explaining how EUVL will be stretched over multiple generations.

Original languageEnglish
Title of host publicationProceedings of the 10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010
EditorsH. Van Brussel, Henny Spaan, P. Shore, Theresa Burke
PublisherEUSPEN
Pages2-5
Number of pages4
ISBN (Electronic)9780955308284
Publication statusPublished - 1 Jan 2010
Externally publishedYes
Event10th EUSPEN International Conference 2010 - Delft, Netherlands
Duration: 31 May 20104 Jun 2010
Conference number: 10

Publication series

NameProceedings of the 10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010
Volume1

Conference

Conference10th EUSPEN International Conference 2010
Abbreviated titleEUSPEN
CountryNetherlands
CityDelft
Period31/05/104/06/10
OtherNOT the same as 10th Anniversary International Conference (see dates and place)

Fingerprint Dive into the research topics of 'Extreme UltraViolet lithography'. Together they form a unique fingerprint.

Cite this