Fabrication and characterization of dual sputtered pd-Cu alloy films for hydrogen separation membranes

H.T.H. Hoang Thi Hanh, D.H. Tong, F.C. Gielens, Henricus V. Jansen, Michael Curt Elwenspoek

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    Abstract

    In this paper, submicron thin Pd–Cu alloy films are deposited using a dual sputtering technique, which allows a high composition control of the layer. The composition, surface morphology and phase structure of the sputtered layers are investigated by energy-dispersive spectrometry (EDS), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray diffractiometry (XRD). For example, the XRD data prove that the Pd–Cu layers are an alloy of Pd and Cu. Subsequently, the characterized Pd–Cu alloy layers are deposited on a silicon support structure to create a 750-nm thin Pd–Cu membrane for hydrogen separation. The reported membrane obtained a high flux of 1.6 mol H2/m2 s at a temperature of 725 K, while the selectivity is at least 500 for H2/He.
    Original languageUndefined
    Pages (from-to)525-528
    Number of pages4
    JournalMaterials letters
    Volume3-4
    Issue number58
    DOIs
    Publication statusPublished - Jan 2004

    Keywords

    • EWI-10249
    • IR-46298
    • METIS-214506

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