Abstract
We present state-of-the-art high resolution transmission gratings, applicable for spectroscopy in the vacuum ultraviolet (VUV) and the soft X-ray (SRX) wavelength range, fabricated with a novel process using ultraviolet based nano imprint lithography (UV-NIL). Free-standing, high-line-density gratings with up to 10,000 lines per mm and various space-to-period ratios were fabricated. An optical characterization of the gratings was carried out in the range from 17 to 34 nm wavelength using high-harmonic generation in a capillary waveguide filled with Ne, and around 13.5 nm wavelength (from 10 to 17 nm) using a Xenon discharge plasma.
Original language | English |
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Pages (from-to) | 4421-4434 |
Journal | Optics express |
Volume | 23 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2015 |