Fabrication and characterization of high-quality uniform and apodized Si3N4 waveguide gratings using laser interference lithography

W.C.L. Hopman, R. Dekker, D. Yudistira, W.F.A. Engbers, Hugo Hoekstra, R.M. de Ridder

  • 8 Citations

Abstract

A method is presented for fabricating high-quality ridge waveguide gratings by combining conventional mask lithography with laser interference lithography. The method, which allows for apodization functions modulating both amplitude and phase of the grating is demonstrated by fabricating a grating that is chirped by width-variation of the grated ridge waveguide. The structure was optically characterized using both an end-fire and an infrared camera setup to measure the transmission and to map and quantify the power scattered out of the grating, respectively. For a uniform grating, we found a value of 8000 for the resonance peak near the lower wavelength band edge, which was almost completely suppressed after apodization.
Original languageUndefined
Pages (from-to)1855-1857
Number of pages3
JournalIEEE photonics technology letters
Volume18
Issue number2/17
DOIs
StatePublished - 2006

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Ridge waveguides
Lithography
Masks
Fires
Cameras
Infrared radiation
Wavelength
Lasers

Keywords

  • IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES
  • IR-57671
  • IOMS-SNS: SENSORS
  • IOMS-PIT: PHOTONICS INTEGRATION TECHNOLOGY
  • METIS-238072
  • EWI-6066

Cite this

Hopman, W. C. L., Dekker, R., Yudistira, D., Engbers, W. F. A., Hoekstra, H., & de Ridder, R. M. (2006). Fabrication and characterization of high-quality uniform and apodized Si3N4 waveguide gratings using laser interference lithography. IEEE photonics technology letters, 18(2/17), 1855-1857. DOI: 10.1109/LPT.2006.881226

Hopman, W.C.L.; Dekker, R.; Yudistira, D.; Engbers, W.F.A.; Hoekstra, Hugo; de Ridder, R.M. / Fabrication and characterization of high-quality uniform and apodized Si3N4 waveguide gratings using laser interference lithography.

In: IEEE photonics technology letters, Vol. 18, No. 2/17, 2006, p. 1855-1857.

Research output: Scientific - peer-reviewArticle

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title = "Fabrication and characterization of high-quality uniform and apodized Si3N4 waveguide gratings using laser interference lithography",
abstract = "A method is presented for fabricating high-quality ridge waveguide gratings by combining conventional mask lithography with laser interference lithography. The method, which allows for apodization functions modulating both amplitude and phase of the grating is demonstrated by fabricating a grating that is chirped by width-variation of the grated ridge waveguide. The structure was optically characterized using both an end-fire and an infrared camera setup to measure the transmission and to map and quantify the power scattered out of the grating, respectively. For a uniform grating, we found a value of 8000 for the resonance peak near the lower wavelength band edge, which was almost completely suppressed after apodization.",
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Hopman, WCL, Dekker, R, Yudistira, D, Engbers, WFA, Hoekstra, H & de Ridder, RM 2006, 'Fabrication and characterization of high-quality uniform and apodized Si3N4 waveguide gratings using laser interference lithography' IEEE photonics technology letters, vol 18, no. 2/17, pp. 1855-1857. DOI: 10.1109/LPT.2006.881226

Fabrication and characterization of high-quality uniform and apodized Si3N4 waveguide gratings using laser interference lithography. / Hopman, W.C.L.; Dekker, R.; Yudistira, D.; Engbers, W.F.A.; Hoekstra, Hugo; de Ridder, R.M.

In: IEEE photonics technology letters, Vol. 18, No. 2/17, 2006, p. 1855-1857.

Research output: Scientific - peer-reviewArticle

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T1 - Fabrication and characterization of high-quality uniform and apodized Si3N4 waveguide gratings using laser interference lithography

AU - Hopman,W.C.L.

AU - Dekker,R.

AU - Yudistira,D.

AU - Engbers,W.F.A.

AU - Hoekstra,Hugo

AU - de Ridder,R.M.

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N2 - A method is presented for fabricating high-quality ridge waveguide gratings by combining conventional mask lithography with laser interference lithography. The method, which allows for apodization functions modulating both amplitude and phase of the grating is demonstrated by fabricating a grating that is chirped by width-variation of the grated ridge waveguide. The structure was optically characterized using both an end-fire and an infrared camera setup to measure the transmission and to map and quantify the power scattered out of the grating, respectively. For a uniform grating, we found a value of 8000 for the resonance peak near the lower wavelength band edge, which was almost completely suppressed after apodization.

AB - A method is presented for fabricating high-quality ridge waveguide gratings by combining conventional mask lithography with laser interference lithography. The method, which allows for apodization functions modulating both amplitude and phase of the grating is demonstrated by fabricating a grating that is chirped by width-variation of the grated ridge waveguide. The structure was optically characterized using both an end-fire and an infrared camera setup to measure the transmission and to map and quantify the power scattered out of the grating, respectively. For a uniform grating, we found a value of 8000 for the resonance peak near the lower wavelength band edge, which was almost completely suppressed after apodization.

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KW - METIS-238072

KW - EWI-6066

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