Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography

Yiping Zhao, Johan W. Berenschot, Meint J. de Boer, Henricus V. Jansen, Niels Roelof Tas, Jurriaan Huskens, Michael Curt Elwenspoek

Research output: Contribution to journalArticleAcademicpeer-review

32 Citations (Scopus)

Abstract

The fabrication of a stamp reinforced with silicon nitride is presented for its use in nanoimprint lithography. The fabrication process is based on edge lithography using conventional optical lithography and wet anisotropic etching of 110 silicon wafers. SiO2 nano-ridges of 20 nm in width were fabricated. A silicon rich nitride layer is deposited over the original SiO2 nano-ridges to improve the ridge strength and to achieve a positive tapered shape which is beneficial for nanoimprinting. A replica of the nano-ridges with silicon rich nitride shield is obtained by imprinting the stamp into thermoplastic nanoimprint polymer mr-I 7010E
Original languageEnglish
Pages (from-to)064013
Number of pages6
JournalJournal of micromechanics and microengineering
Volume18
Issue number18
DOIs
Publication statusPublished - 2008

Keywords

  • EWI-14705
  • IR-62640
  • METIS-254128

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