Fabrication of a subminiature silicon condenser microphone using the sacrificial layer technique

P.R. Scheeper; W. Olthuis; P. Bergveld

doi:10.1109/SENSOR.1991.148898

Fabrication of a subminiature silicon condenser microphone using the sacrificial layer technique

P.R. Scheeper, W. Olthuis, P. Bergveld

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

19 Citations (Scopus)

60 Downloads (Pure)

Abstract

The application of the sacrificial layer technique for the fabrication of a subminiature silicon condenser microphone with a plasma-enhanced chemical vapor deposited silicon nitride diaphragm has been investigated. Square diaphragms with dimensions from 0.6 to 2.6 mm and a thickness of 1 ¿m have been realized. Measurements on a microphone with a 2×2 mm diaphragm and a 1 ¿m airgap have shown that a sensitivity of 1.4 mV/Pa for low frequencies can be achieved with a low bias voltage (-2 V). The sensitivity decreases for high frequencies. This effect is probably due to the small airgap. Therefore, microphones with wider airgaps have to be developed to achieve a flat frequency response for the entire audio frequency range

Original language	English
Title of host publication	Transducers '91
Subtitle of host publication	1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers
Place of Publication	Piscataway, NJ
Publisher	IEEE
Pages	408-411
Number of pages	4
ISBN (Print)	9780879425852
DOIs	https://doi.org/10.1109/SENSOR.1991.148898
Publication status	Published - 24 Jun 1991
Event	1991 International Conference on Solid-State Sensors and Actuators, TRANSDUCERS 1991 - San Francisco, United States Duration: 24 Jun 1991 → 27 Jun 1991

Conference

Conference	1991 International Conference on Solid-State Sensors and Actuators, TRANSDUCERS 1991
Abbreviated title	TRANSDUCERS '91
Country	United States
City	San Francisco
Period	24/06/91 → 27/06/91

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10.1109/SENSOR.1991.148898

Scheeper1991fabrication
open
Final published version, 314 KB

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title = "Fabrication of a subminiature silicon condenser microphone using the sacrificial layer technique",

abstract = "The application of the sacrificial layer technique for the fabrication of a subminiature silicon condenser microphone with a plasma-enhanced chemical vapor deposited silicon nitride diaphragm has been investigated. Square diaphragms with dimensions from 0.6 to 2.6 mm and a thickness of 1 ¿m have been realized. Measurements on a microphone with a 2×2 mm diaphragm and a 1 ¿m airgap have shown that a sensitivity of 1.4 mV/Pa for low frequencies can be achieved with a low bias voltage (-2 V). The sensitivity decreases for high frequencies. This effect is probably due to the small airgap. Therefore, microphones with wider airgaps have to be developed to achieve a flat frequency response for the entire audio frequency range",

author = "P.R. Scheeper and W. Olthuis and P. Bergveld",

year = "1991",

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pages = "408--411",

booktitle = "Transducers '91",

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Scheeper, PR, Olthuis, W & Bergveld, P 1991, Fabrication of a subminiature silicon condenser microphone using the sacrificial layer technique. in Transducers '91: 1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers. IEEE, Piscataway, NJ, pp. 408-411, 1991 International Conference on Solid-State Sensors and Actuators, TRANSDUCERS 1991, San Francisco, United States, 24/06/91. https://doi.org/10.1109/SENSOR.1991.148898

Fabrication of a subminiature silicon condenser microphone using the sacrificial layer technique. / Scheeper, P.R.; Olthuis, W.; Bergveld, P.

Transducers '91: 1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers. Piscataway, NJ : IEEE, 1991. p. 408-411.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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N2 - The application of the sacrificial layer technique for the fabrication of a subminiature silicon condenser microphone with a plasma-enhanced chemical vapor deposited silicon nitride diaphragm has been investigated. Square diaphragms with dimensions from 0.6 to 2.6 mm and a thickness of 1 ¿m have been realized. Measurements on a microphone with a 2×2 mm diaphragm and a 1 ¿m airgap have shown that a sensitivity of 1.4 mV/Pa for low frequencies can be achieved with a low bias voltage (-2 V). The sensitivity decreases for high frequencies. This effect is probably due to the small airgap. Therefore, microphones with wider airgaps have to be developed to achieve a flat frequency response for the entire audio frequency range

AB - The application of the sacrificial layer technique for the fabrication of a subminiature silicon condenser microphone with a plasma-enhanced chemical vapor deposited silicon nitride diaphragm has been investigated. Square diaphragms with dimensions from 0.6 to 2.6 mm and a thickness of 1 ¿m have been realized. Measurements on a microphone with a 2×2 mm diaphragm and a 1 ¿m airgap have shown that a sensitivity of 1.4 mV/Pa for low frequencies can be achieved with a low bias voltage (-2 V). The sensitivity decreases for high frequencies. This effect is probably due to the small airgap. Therefore, microphones with wider airgaps have to be developed to achieve a flat frequency response for the entire audio frequency range

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DO - 10.1109/SENSOR.1991.148898

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