Fabrication of a subminiature silicon condenser microphone using the sacrificial layer technique

P.R. Scheeper, W. Olthuis, P. Bergveld

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    19 Citations (Scopus)
    60 Downloads (Pure)

    Abstract

    The application of the sacrificial layer technique for the fabrication of a subminiature silicon condenser microphone with a plasma-enhanced chemical vapor deposited silicon nitride diaphragm has been investigated. Square diaphragms with dimensions from 0.6 to 2.6 mm and a thickness of 1 ¿m have been realized. Measurements on a microphone with a 2×2 mm diaphragm and a 1 ¿m airgap have shown that a sensitivity of 1.4 mV/Pa for low frequencies can be achieved with a low bias voltage (-2 V). The sensitivity decreases for high frequencies. This effect is probably due to the small airgap. Therefore, microphones with wider airgaps have to be developed to achieve a flat frequency response for the entire audio frequency range
    Original languageEnglish
    Title of host publicationTransducers '91
    Subtitle of host publication1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers
    Place of PublicationPiscataway, NJ
    PublisherIEEE
    Pages408-411
    Number of pages4
    ISBN (Print)9780879425852
    DOIs
    Publication statusPublished - 24 Jun 1991
    Event1991 International Conference on Solid-State Sensors and Actuators, TRANSDUCERS 1991 - San Francisco, United States
    Duration: 24 Jun 199127 Jun 1991

    Conference

    Conference1991 International Conference on Solid-State Sensors and Actuators, TRANSDUCERS 1991
    Abbreviated titleTRANSDUCERS '91
    CountryUnited States
    CitySan Francisco
    Period24/06/9127/06/91

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