Abstract
In this paper, a novel fabrication process for the realization of large, suspended microfluidic channels is presented. The method is based on Buried Channel Technology and uses a mixture of HF, HNO3, and water etchant, which has high selectivity between the silicon substrate and the silicon-rich silicon nitride mask material. Metal electrodes for actuation and read-out are integrated into the fabrication process. The microfluidic channels are released from the silicon substrate to allow the vibrational movement needed for the application. The resulting microfluidic channels have a near-circular cross-section, with a diameter up to 300 μm and a channel wall thickness of 1.5 μm. The structure of a micro-Coriolis mass-flow and density sensor is fabricated with this process as an example of a possible application.
Original language | English |
---|---|
Article number | 1230 |
Journal | Micromachines |
Volume | 15 |
Issue number | 10 |
DOIs | |
Publication status | Published - Oct 2024 |
Keywords
- Buried channel technology
- Coriolis mass-flow sensor
- HNA etching
- Microfluidic channel