Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography

C. Acikgoz, X.Y. Ling, In Yee Phang, Mark A. Hempenius, David Reinhoudt, Jurriaan Huskens, Gyula J. Vancso

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Abstract

Freestanding nanoporous polysulfone membranes are fabricated using nanosphere lithography, in which colloidal silica particles act as a template for the organometallic etch resist, which is composed of poly(ferrocenylsilanes). As shown in the figure, the membranes are robust enough to be removed from the silica wafers where they were produced. They can subsequently be used to separate particles of different sizes.
Original languageUndefined
Pages (from-to)2064-2067
Number of pages4
JournalAdvanced materials
Volume21
Issue number20
DOIs
Publication statusPublished - 2009

Keywords

  • reactive ion etching
  • IR-72086
  • Nanolithography
  • Membranes
  • nanoporous materials
  • porous polymers
  • organometallics
  • METIS-259857

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