Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography

C. Acikgoz, X.Y. Ling, In Yee Phang, Mark A. Hempenius, David Reinhoudt, Jurriaan Huskens, Gyula J. Vancso

Research output: Contribution to conferencePoster

Original languageUndefined
Pages-
Publication statusPublished - 16 Nov 2008

Keywords

  • METIS-254556

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