Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography

C. Acikgoz, X.Y. Ling, In Yee Phang, Mark A. Hempenius, David Reinhoudt, Jurriaan Huskens, Gyula J. Vancso

Research output: Contribution to conferencePosterOther research output

Original languageUndefined
Publication statusPublished - 16 Nov 2008


  • METIS-254556

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