Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography

C. Acikgoz; X.Y. Ling; In Yee Phang; Mark A. Hempenius; David Reinhoudt; Jurriaan Huskens; Gyula J. Vancso

Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography

C. Acikgoz
, X.Y. Ling
, In Yee Phang
, Mark A. Hempenius
, David Reinhoudt
, Jurriaan Huskens
, Gyula J. Vancso

Research output: Contribution to conference › Poster › Other research output

Original language	Undefined
Pages	-
Publication status	Published - 16 Nov 2008
Event	Netherlands MicroNanoConference 2008 - De Reehorst, Ede, Netherlands Duration: 17 Nov 2008 → 19 Nov 2008

Conference

Conference	Netherlands MicroNanoConference 2008
Country/Territory	Netherlands
City	Ede
Period	17/11/08 → 19/11/08

Keywords

METIS-254556

Cite this

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title = "Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography",

keywords = "METIS-254556",

author = "C. Acikgoz and X.Y. Ling and Phang, \{In Yee\} and Hempenius, \{Mark A.\} and David Reinhoudt and Jurriaan Huskens and Vancso, \{Gyula J.\}",

year = "2008",

month = nov,

day = "16",

language = "Undefined",

pages = "--",

note = "Netherlands MicroNanoConference 2008 ; Conference date: 17-11-2008 Through 19-11-2008",

}

TY - CONF

T1 - Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography

AU - Acikgoz, C.

AU - Ling, X.Y.

AU - Phang, In Yee

AU - Hempenius, Mark A.

AU - Reinhoudt, David

AU - Huskens, Jurriaan

AU - Vancso, Gyula J.

PY - 2008/11/16

Y1 - 2008/11/16

KW - METIS-254556

M3 - Poster

SP - -

T2 - Netherlands MicroNanoConference 2008

Y2 - 17 November 2008 through 19 November 2008

ER -