Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography

C. Acikgoz, X.Y. Ling, In Yee Phang, Mark A. Hempenius, David Reinhoudt, Jurriaan Huskens, Gyula J. Vancso

Research output: Contribution to conferencePosterOther research output

Original languageUndefined
Pages-
Publication statusPublished - 2 Feb 2009
EventDutch Polymer Days, DPD 2009 - Lunteren, Netherlands
Duration: 2 Feb 20093 Feb 2009

Conference

ConferenceDutch Polymer Days, DPD 2009
Abbreviated titleDPD
CountryNetherlands
CityLunteren
Period2/02/093/02/09

Keywords

  • METIS-258334

Cite this

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title = "Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography",
keywords = "METIS-258334",
author = "C. Acikgoz and X.Y. Ling and Phang, {In Yee} and Hempenius, {Mark A.} and David Reinhoudt and Jurriaan Huskens and Vancso, {Gyula J.}",
year = "2009",
month = "2",
day = "2",
language = "Undefined",
pages = "--",
note = "null ; Conference date: 02-02-2009 Through 03-02-2009",

}

Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography. / Acikgoz, C.; Ling, X.Y.; Phang, In Yee; Hempenius, Mark A.; Reinhoudt, David; Huskens, Jurriaan; Vancso, Gyula J.

2009. - Poster session presented at Dutch Polymer Days, DPD 2009, Lunteren, Netherlands.

Research output: Contribution to conferencePosterOther research output

TY - CONF

T1 - Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography

AU - Acikgoz, C.

AU - Ling, X.Y.

AU - Phang, In Yee

AU - Hempenius, Mark A.

AU - Reinhoudt, David

AU - Huskens, Jurriaan

AU - Vancso, Gyula J.

PY - 2009/2/2

Y1 - 2009/2/2

KW - METIS-258334

M3 - Poster

SP - -

ER -

Acikgoz C, Ling XY, Phang IY, Hempenius MA, Reinhoudt D, Huskens J et al. Fabrication of free-standing nanoporous polyethersulfone membranes by organometallic polymer resists patterned by nanosphere lithography. 2009. Poster session presented at Dutch Polymer Days, DPD 2009, Lunteren, Netherlands.