Fabrication of low-loss silicon nitride PICs for stimulated Brillouin scattering

Randy te Morsche; Ahmet Tarık Işık; Akshay Keloth; Zheng Zheng; P.J.M. van der Slot; David Marpaung

Fabrication of low-loss silicon nitride PICs for stimulated Brillouin scattering

Randy te Morsche
, Ahmet Tarık Işık (Contributor)
, Akshay Keloth (Contributor)
, Zheng Zheng (Contributor)
, P.J.M. van der Slot (Contributor)
, David Marpaung (Contributor)

Research output: Contribution to conference › Poster › Academic

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Abstract

Silicon nitride (Si₃N₄) is well-established in PIC technology due to its low loss, broad transparency and seamless compatibility with existing semiconductor fabrication processes. We have developed a thin Si₃N₄ platform supporting low-loss waveguiding and high-Q resonators. We measure stimulated Brillouin scattering using a lock-in amplifier, enabling the development of future high-performance acousto-optic devices.

Original language	English
Number of pages	1
Publication status	Published - 16 Oct 2024
Event	PIC Summit Europe 2024 - Evoluon, Eindhoven, Netherlands Duration: 15 Oct 2024 → 16 Oct 2024

Conference

Conference	PIC Summit Europe 2024
Country/Territory	Netherlands
City	Eindhoven
Period	15/10/24 → 16/10/24

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title = "Fabrication of low-loss silicon nitride PICs for stimulated Brillouin scattering",

abstract = "Silicon nitride (Si3N4) is well-established in PIC technology due to its low loss, broad transparency and seamless compatibility with existing semiconductor fabrication processes. We have developed a thin Si3N4 platform supporting low-loss waveguiding and high-Q resonators. We measure stimulated Brillouin scattering using a lock-in amplifier, enabling the development of future high-performance acousto-optic devices. ",

author = "\{te Morsche\}, Randy and I{\c s}ık, \{Ahmet Tarık\} and Akshay Keloth and Zheng Zheng and \{van der Slot\}, P.J.M. and David Marpaung",

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language = "English",

note = "PIC Summit Europe 2024 ; Conference date: 15-10-2024 Through 16-10-2024",

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T1 - Fabrication of low-loss silicon nitride PICs for stimulated Brillouin scattering

AU - te Morsche, Randy

A2 - Işık, Ahmet Tarık

A2 - Keloth, Akshay

A2 - Zheng, Zheng

A2 - van der Slot, P.J.M.

A2 - Marpaung, David

PY - 2024/10/16

Y1 - 2024/10/16

N2 - Silicon nitride (Si3N4) is well-established in PIC technology due to its low loss, broad transparency and seamless compatibility with existing semiconductor fabrication processes. We have developed a thin Si3N4 platform supporting low-loss waveguiding and high-Q resonators. We measure stimulated Brillouin scattering using a lock-in amplifier, enabling the development of future high-performance acousto-optic devices.

AB - Silicon nitride (Si3N4) is well-established in PIC technology due to its low loss, broad transparency and seamless compatibility with existing semiconductor fabrication processes. We have developed a thin Si3N4 platform supporting low-loss waveguiding and high-Q resonators. We measure stimulated Brillouin scattering using a lock-in amplifier, enabling the development of future high-performance acousto-optic devices.

M3 - Poster

T2 - PIC Summit Europe 2024

Y2 - 15 October 2024 through 16 October 2024

ER -

Fabrication of low-loss silicon nitride PICs for stimulated Brillouin scattering

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