Fabrication of micron-sized tetrahedra by Si〈1 1 1〉 micromachining and retraction edge lithography

Rajeevan Kozhummal, Johan W. Berenschot, Henricus V. Jansen, Niels Roelof Tas, Margit Zacharias, Michael Curt Elwenspoek

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    Abstract

    A new method is proposed to prepare micron-sized anisotropic-shaped particles: tetrahedral structures bounded by 〈1 1 1〉 faces. It is based on the micromachining of 〈1 1 1〉-oriented silicon wafers and retraction edge lithography (REL). The size of these Si structures is tunable but limited: roughly from 20 to 2000 nm. The importance of this method is that the fabricated structure resembles almost perfectly the mathematical tetrahedron. Furthermore, the technique offers room to change the anisotropic property of the particle by selective modification of the faces using self-aligned lithography.
    Original languageUndefined
    Pages (from-to)085032
    Number of pages7
    JournalJournal of micromechanics and microengineering
    Volume22
    Issue number8
    DOIs
    Publication statusPublished - 20 Jul 2012

    Keywords

    • IR-83663
    • EWI-22777
    • METIS-296189

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