Fabrication of patterned magnetic nanodots by laser interference lithography

R. Murillo Vallejo, Hendricus A.G.M. van Wolferen, Leon Abelmann, J.C. Lodder

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    A method of fabrication of patterned magnetic nanodots by means of laser interference lithography is presented. This method includes the use of a diluted positive photoresist, and modifcations in the etching angle and acceleration voltage of the ion beam etching process. Vertical standing waves were suppressed by using a high exposure dose (supra-exposure) instead of an antireflective coating. Field dependent magnetic force microscopy was used to measure the switching field distribution, which was found to range from 80 to 192 kA/m.
    Original languageUndefined
    Article number10.1016/j.mee.2005.01.004
    Pages (from-to)260-265
    Number of pages6
    JournalMicroelectronic engineering
    Issue number2005
    Publication statusPublished - 2005


    • TST-uSPAM: micro Scanning Probe Array Memory
    • EWI-5599
    • TST-LIL: Laser Interference Lithography
    • METIS-225031
    • SMI-TST: From 2006 in EWI-TST
    • IR-63015

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