Fabrication of three-dimensional hybrid nanostructures by an integrated process comprising nanoimprint lithography and layer-by-layer assembly

J. Huskens*, P. Maury, O. Crespo-Biel, M. Péter, D. N. Reinhoudt

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

3 Citations (Scopus)

Abstract

The fabrication of three-dimensional (3D) nanostructures, which have sub-100 nm dimensions in all three directions that can be changed independently for each dimension, is a key issue of nanotechnology. E-beam writing can provide high-resolution two-dimensional (2D) nanopatterns, but implementation of pattern replication methods for rapid reproduction of a master and self-assembly, to provide patterned growth of structures, is essential for the development of more general and versatile 3D nanofabrication methodologies. Here the integration of top-down nanoimprint lithography (NIL) and bottom-up layer-by-layer self-assembly (LBL-SA) are described for the preparation of 3D hybrid nanostructures. NIL provided down to sub-100nm poly(methylmethacrylate) (PMMA) structures. These were employed to fabricate patterned self-assembled monolayers of cyclodextrin (CD) host molecules on silicon oxide. The consecutive LBL-SA with adamantyl guest-functionalized dendrimers and CD-modified gold nanoparticles resulted in patterned multilayer structures with thicknesses of 3-30 nm. The x, y control by NIL and the z control (albeit the same height for all nanostructures simultaneously) by LBL-SA ultimately allowed the fabrication of circular structures with a radius of 25 nm and a thickness of 20 nm. The integration of the two methods has thus yielded a versatile 3D nanofabrication methodology comprising 10-40 process steps.

Original languageEnglish
Pages (from-to)157-163
Number of pages7
JournalProceedings of the Institution of Mechanical Engineers, Part N: Journal of Nanoengineering and Nanosystems
Volume219
Issue number4
DOIs
Publication statusPublished - 1 Dec 2005

Keywords

  • layer-by-layer assembly
  • multilayers
  • nanoimprint lithography
  • nanoparticles
  • self-assembled monolayers

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