TY - JOUR
T1 - Fabrication of three-dimensional hybrid nanostructures by an integrated process comprising nanoimprint lithography and layer-by-layer assembly
AU - Huskens, J.
AU - Maury, P.
AU - Crespo-Biel, O.
AU - Péter, M.
AU - Reinhoudt, D. N.
PY - 2005/12/1
Y1 - 2005/12/1
N2 - The fabrication of three-dimensional (3D) nanostructures, which have sub-100 nm dimensions in all three directions that can be changed independently for each dimension, is a key issue of nanotechnology. E-beam writing can provide high-resolution two-dimensional (2D) nanopatterns, but implementation of pattern replication methods for rapid reproduction of a master and self-assembly, to provide patterned growth of structures, is essential for the development of more general and versatile 3D nanofabrication methodologies. Here the integration of top-down nanoimprint lithography (NIL) and bottom-up layer-by-layer self-assembly (LBL-SA) are described for the preparation of 3D hybrid nanostructures. NIL provided down to sub-100nm poly(methylmethacrylate) (PMMA) structures. These were employed to fabricate patterned self-assembled monolayers of cyclodextrin (CD) host molecules on silicon oxide. The consecutive LBL-SA with adamantyl guest-functionalized dendrimers and CD-modified gold nanoparticles resulted in patterned multilayer structures with thicknesses of 3-30 nm. The x, y control by NIL and the z control (albeit the same height for all nanostructures simultaneously) by LBL-SA ultimately allowed the fabrication of circular structures with a radius of 25 nm and a thickness of 20 nm. The integration of the two methods has thus yielded a versatile 3D nanofabrication methodology comprising 10-40 process steps.
AB - The fabrication of three-dimensional (3D) nanostructures, which have sub-100 nm dimensions in all three directions that can be changed independently for each dimension, is a key issue of nanotechnology. E-beam writing can provide high-resolution two-dimensional (2D) nanopatterns, but implementation of pattern replication methods for rapid reproduction of a master and self-assembly, to provide patterned growth of structures, is essential for the development of more general and versatile 3D nanofabrication methodologies. Here the integration of top-down nanoimprint lithography (NIL) and bottom-up layer-by-layer self-assembly (LBL-SA) are described for the preparation of 3D hybrid nanostructures. NIL provided down to sub-100nm poly(methylmethacrylate) (PMMA) structures. These were employed to fabricate patterned self-assembled monolayers of cyclodextrin (CD) host molecules on silicon oxide. The consecutive LBL-SA with adamantyl guest-functionalized dendrimers and CD-modified gold nanoparticles resulted in patterned multilayer structures with thicknesses of 3-30 nm. The x, y control by NIL and the z control (albeit the same height for all nanostructures simultaneously) by LBL-SA ultimately allowed the fabrication of circular structures with a radius of 25 nm and a thickness of 20 nm. The integration of the two methods has thus yielded a versatile 3D nanofabrication methodology comprising 10-40 process steps.
KW - layer-by-layer assembly
KW - multilayers
KW - nanoimprint lithography
KW - nanoparticles
KW - self-assembled monolayers
UR - http://www.scopus.com/inward/record.url?scp=84990328208&partnerID=8YFLogxK
U2 - 10.1243/17403499JNN49
DO - 10.1243/17403499JNN49
M3 - Article
AN - SCOPUS:84990328208
VL - 219
SP - 157
EP - 163
JO - Proceedings of the Institution of Mechanical Engineers, Part N: Journal of Nanomaterials, Nanoengineering and Nanosystems
JF - Proceedings of the Institution of Mechanical Engineers, Part N: Journal of Nanomaterials, Nanoengineering and Nanosystems
SN - 2397-7914
IS - 4
ER -