Fabrication of ultrathin films of Ta2O5 by a sol-gel method

M.J. Wolf*, S. Roitsch, J. Mayer, Arian Nijmeijer, H.J.M. Bouwmeester

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

22 Citations (Scopus)
66 Downloads (Pure)


Tantalum oxide (Ta2O5) is widely known for its high chemical, thermal and hydrothermal stability. In this study, a sol–gel method has been developed to produce homogenous, i.e., defect and pin-hole free, ultrathin films of Ta2O5. These were coated onto a porous substrate by means of dip-coating, and subsequently fired at 400 °C. Despite their small thickness of only 30–40 nm, the films showed very low gas permeation.
Original languageEnglish
Pages (from-to)354-357
JournalThin solid films
Publication statusPublished - 2013


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