Fabrication of ultrathin films of Ta2O5 by a sol-gel method

M.J. Wolf, J. Roitsch, J. Mayer, Arian Nijmeijer, Henricus J.M. Bouwmeester

Research output: Contribution to journalArticleAcademicpeer-review

9 Citations (Scopus)

Abstract

Tantalum oxide (Ta2O5) is widely known for its high chemical, thermal and hydrothermal stability. In this study, a sol–gel method has been developed to produce homogenous, i.e., defect and pin-hole free, ultrathin films of Ta2O5. These were coated onto a porous substrate by means of dip-coating, and subsequently fired at 400 °C. Despite their small thickness of only 30–40 nm, the films showed very low gas permeation.
Original languageEnglish
Pages (from-to)354-357
JournalThin solid films
Volume527
DOIs
Publication statusPublished - 2013

Fingerprint

Tantalum oxides
Ultrathin films
Permeation
Sol-gel process
Gases
gels
tantalum oxides
Fabrication
Coatings
Defects
fabrication
Substrates
coating
thermal stability
defects
gases
Hot Temperature
tantalum oxide

Keywords

  • IR-83343
  • METIS-293654

Cite this

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title = "Fabrication of ultrathin films of Ta2O5 by a sol-gel method",
abstract = "Tantalum oxide (Ta2O5) is widely known for its high chemical, thermal and hydrothermal stability. In this study, a sol–gel method has been developed to produce homogenous, i.e., defect and pin-hole free, ultrathin films of Ta2O5. These were coated onto a porous substrate by means of dip-coating, and subsequently fired at 400 °C. Despite their small thickness of only 30–40 nm, the films showed very low gas permeation.",
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author = "M.J. Wolf and J. Roitsch and J. Mayer and Arian Nijmeijer and Bouwmeester, {Henricus J.M.}",
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language = "English",
volume = "527",
pages = "354--357",
journal = "Thin solid films",
issn = "0040-6090",
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Fabrication of ultrathin films of Ta2O5 by a sol-gel method. / Wolf, M.J.; Roitsch, J.; Mayer, J.; Nijmeijer, Arian; Bouwmeester, Henricus J.M.

In: Thin solid films, Vol. 527, 2013, p. 354-357.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Fabrication of ultrathin films of Ta2O5 by a sol-gel method

AU - Wolf, M.J.

AU - Roitsch, J.

AU - Mayer, J.

AU - Nijmeijer, Arian

AU - Bouwmeester, Henricus J.M.

PY - 2013

Y1 - 2013

N2 - Tantalum oxide (Ta2O5) is widely known for its high chemical, thermal and hydrothermal stability. In this study, a sol–gel method has been developed to produce homogenous, i.e., defect and pin-hole free, ultrathin films of Ta2O5. These were coated onto a porous substrate by means of dip-coating, and subsequently fired at 400 °C. Despite their small thickness of only 30–40 nm, the films showed very low gas permeation.

AB - Tantalum oxide (Ta2O5) is widely known for its high chemical, thermal and hydrothermal stability. In this study, a sol–gel method has been developed to produce homogenous, i.e., defect and pin-hole free, ultrathin films of Ta2O5. These were coated onto a porous substrate by means of dip-coating, and subsequently fired at 400 °C. Despite their small thickness of only 30–40 nm, the films showed very low gas permeation.

KW - IR-83343

KW - METIS-293654

U2 - 10.1016/j.tsf.2012.12.054

DO - 10.1016/j.tsf.2012.12.054

M3 - Article

VL - 527

SP - 354

EP - 357

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

ER -