Tantalum oxide (Ta2O5) is widely known for its high chemical, thermal and hydrothermal stability. In this study, a sol–gel method has been developed to produce homogenous, i.e., defect and pin-hole free, ultrathin films of Ta2O5. These were coated onto a porous substrate by means of dip-coating, and subsequently fired at 400 °C. Despite their small thickness of only 30–40 nm, the films showed very low gas permeation.
Wolf, M. J., Roitsch, J., Mayer, J., Nijmeijer, A., & Bouwmeester, H. J. M. (2013). Fabrication of ultrathin films of Ta2O5 by a sol-gel method. Thin solid films, 527, 354-357. https://doi.org/10.1016/j.tsf.2012.12.054