Fast etching of sacrificial galvanic coupled metals for nanochannel fabrication: experiments and theory

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    Abstract

    We demonstrate a 10-fold enhancement of the etch rate of sacrificial metals for nanochannel fabrication by galvanic coupling. This results in an etch time for the here examined nanochannels of 10 hours instead of 9 days without galvanic coupling. An additional feature of our device is that we integrated bare electrodes inside the channel. Furthermore, we offer a theoretical explanation of the observed etch rate based on mass transport.
    Original languageUndefined
    Title of host publicationEleventh International Conference on Miniaturized Systems for Chemistry and Life Sciences - The proceedings of microTAS 2007 Conference
    EditorsJ.L. Viovy, P Tabeling, S. Descroix, L. Malaquin
    Place of PublicationSan Diego
    PublisherThe Chemical and Biological Microsystems Society
    Pages515-517
    Number of pages3
    ISBN (Print)978-0-9798064-0-7
    Publication statusPublished - 7 Oct 2007
    Event11th International Conference on Miniaturized Systems for Chemistry and Life Sciences, µTAS 2007 - Paris, France
    Duration: 7 Oct 200711 Oct 2007
    Conference number: 11

    Publication series

    NameMicro Total Analysis Systems
    PublisherChemical and Biological Microsystems Society
    Number7
    Volume1

    Conference

    Conference11th International Conference on Miniaturized Systems for Chemistry and Life Sciences, µTAS 2007
    Abbreviated titleMicroTAS
    Country/TerritoryFrance
    CityParis
    Period7/10/0711/10/07

    Keywords

    • EWI-11489
    • METIS-245818
    • IR-62038

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