Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching

C.G. Bostan, R.M. de Ridder, V.J. Gadgil, H. Kelderman, A. Driessen, L. Kuipers

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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Abstract

A combination of conventional optical lithography and focused ion beam etching provides a novel method for fast and precise (10 nm accuracy) prototyping of planar photonic crystal structures having submicron features, in silicon on insulator wafers.
Original languageUndefined
Title of host publicationTwelfth European Conference on Integrated Optics, ECIO'05
Place of PublicationGrenoble, France
PublisherMinatec
Pages534-537
Number of pages4
ISBN (Print)not assigned
Publication statusPublished - Apr 2005
Event12th European Conference on Integrated Optics, ECIO 2005 - Congress Center WTC Grenoble, Grenoble, France
Duration: 6 Apr 20058 Apr 2005
Conference number: 12

Publication series

Name
PublisherMinatec

Conference

Conference12th European Conference on Integrated Optics, ECIO 2005
Abbreviated titleECIO
CountryFrance
CityGrenoble
Period6/04/058/04/05

Keywords

  • Focused Ion Beam
  • Photonic Crystal
  • Silicon on Insulator
  • EWI-1913
  • IR-65577
  • Alignment
  • Air Bridge
  • Lithography
  • FIB
  • METIS-228193

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