Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching

C.G. Bostan; R.M. de Ridder; V.J. Gadgil; H. Kelderman; A. Driessen; L. Kuipers

Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching

C.G. Bostan
, R.M. de Ridder
, V.J. Gadgil
, H. Kelderman
, A. Driessen
, L. Kuipers

Optical Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

A combination of conventional optical lithography and focused ion beam etching provides a novel method for fast and precise (10 nm accuracy) prototyping of planar photonic crystal structures having submicron features, in silicon on insulator wafers.

Original language	Undefined
Title of host publication	Twelfth European Conference on Integrated Optics, ECIO'05
Place of Publication	Grenoble, France
Publisher	Minatec
Pages	534-537
Number of pages	4
ISBN (Print)	not assigned
Publication status	Published - Apr 2005
Event	12th European Conference on Integrated Optics, ECIO 2005 - Congress Center WTC Grenoble, Grenoble, France Duration: 6 Apr 2005 → 8 Apr 2005 Conference number: 12

Publication series

Name
Publisher	Minatec

Conference

Conference	12th European Conference on Integrated Optics, ECIO 2005
Abbreviated title	ECIO
Country/Territory	France
City	Grenoble
Period	6/04/05 → 8/04/05

Keywords

Focused Ion Beam
Photonic Crystal
Silicon on Insulator
EWI-1913
IR-65577
Alignment
Air Bridge
Lithography
FIB
METIS-228193

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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Cite this

@inproceedings{11201966864347549fcee643fca74ce1,

title = "Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching",

abstract = "A combination of conventional optical lithography and focused ion beam etching provides a novel method for fast and precise (10 nm accuracy) prototyping of planar photonic crystal structures having submicron features, in silicon on insulator wafers.",

keywords = "Focused Ion Beam, Photonic Crystal, Silicon on Insulator, EWI-1913, IR-65577, Alignment, Air Bridge, Lithography, FIB, METIS-228193",

author = "C.G. Bostan and \{de Ridder\}, R.M. and V.J. Gadgil and H. Kelderman and A. Driessen and L. Kuipers",

year = "2005",

month = apr,

language = "Undefined",

isbn = "not assigned",

publisher = "Minatec",

pages = "534--537",

booktitle = "Twelfth European Conference on Integrated Optics, ECIO'05",

note = "12th European Conference on Integrated Optics, ECIO 2005 ; Conference date: 06-04-2005 Through 08-04-2005",

}

Bostan, CG, de Ridder, RM, Gadgil, VJ, Kelderman, H, Driessen, A & Kuipers, L 2005, Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching. in Twelfth European Conference on Integrated Optics, ECIO'05. Minatec, Grenoble, France, pp. 534-537, 12th European Conference on Integrated Optics, ECIO 2005, Grenoble, France, 6/04/05.

Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching. / Bostan, C.G.; de Ridder, R.M.; Gadgil, V.J. et al.
Twelfth European Conference on Integrated Optics, ECIO'05. Grenoble, France: Minatec, 2005. p. 534-537.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Fast prototyping of planar photonic crystal components using a combination of optical lithography and focused ion beam etching

AU - Bostan, C.G.

AU - de Ridder, R.M.

AU - Gadgil, V.J.

AU - Kelderman, H.

AU - Driessen, A.

AU - Kuipers, L.

N1 - Conference code: 12

PY - 2005/4

Y1 - 2005/4

N2 - A combination of conventional optical lithography and focused ion beam etching provides a novel method for fast and precise (10 nm accuracy) prototyping of planar photonic crystal structures having submicron features, in silicon on insulator wafers.

AB - A combination of conventional optical lithography and focused ion beam etching provides a novel method for fast and precise (10 nm accuracy) prototyping of planar photonic crystal structures having submicron features, in silicon on insulator wafers.

KW - Focused Ion Beam

KW - Photonic Crystal

KW - Silicon on Insulator

KW - EWI-1913

KW - IR-65577

KW - Alignment

KW - Air Bridge

KW - Lithography

KW - FIB

KW - METIS-228193

M3 - Conference contribution

SN - not assigned

SP - 534

EP - 537

BT - Twelfth European Conference on Integrated Optics, ECIO'05

PB - Minatec

CY - Grenoble, France

T2 - 12th European Conference on Integrated Optics, ECIO 2005

Y2 - 6 April 2005 through 8 April 2005

ER -