Finite element modeling of the neuron-electrode interface: sealing resistance and stimulus transfer at transitions from complete to defect sealing

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    Abstract

    The quality of the electrical contact between a cultured neuron and a substrate embedded microelectrode is of importance for effective transfer of an extracellular applied stimulus current to the intracellular potential. It is affected by the resistance of the seal, i.e. the gap between the cell membrane and the substrate, which restricts the leakage current, thereby favouring the efficiency of the stimulation current. The effects of variations in the geometry of the neuron-electrode interface on the sealing resistance and on the stimulus transfer are studied using a finite element model of this interface. Variations in the geometry of the neuron-electrode interface are represented by the eccentricity, xc, of a pillbox shaped neuron with radius rc, cultured on an electrode with radius r c. The results indicate a sharp decrease in both sealing resistance and stimulus transfer when a transition occurs from complete sealing to defect sealing. At that point the leakage current splits up into a current through the gap and a current through the sealing defect
    Original languageUndefined
    Title of host publicationProceedings of the 20th Annual International Conference of the IEEE Engineering in Medicine and Biology Society
    Place of PublicationHong Kong, China
    PublisherIEEE
    Pages2854-2857
    Number of pages4
    ISBN (Print)0-7803-5164-9
    DOIs
    Publication statusPublished - 29 Oct 1998
    Event20th Annual International Conference of the IEEE Engineering in Medicine and Biology Society, EMBC 1998 - Hong Kong, Hong Kong
    Duration: 29 Oct 19981 Nov 1998
    Conference number: 20

    Publication series

    Name
    PublisherIEEE
    Volume6

    Conference

    Conference20th Annual International Conference of the IEEE Engineering in Medicine and Biology Society, EMBC 1998
    Abbreviated titleEMBC
    CountryHong Kong
    CityHong Kong
    Period29/10/981/11/98

    Keywords

    • IR-16389
    • METIS-113274

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