Focused ion beam milling of three dimensional nanostructures with high precision

R.W. Tjerkstra, F.B. Segerink, J.J. Kelly, W.L. Vos

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Abstract

The fabrication of an extended three-dimensional nanostructure with dimensions much larger than the feature size using a focused ion beam is described. By milling two identical patterns of pores with a designed diameter of 460 nm in orthogonal directions, a photonic crystal with an inverse woodpile structure was made in a gallium phosphide single crystal. The patterns are aligned with an unprecedented accuracy of 30 nm with respect to each other. The influence of GaP redeposition on the depth, shape, and size of the pores is described. The work is published in J. Vac. Sci. Technol. B [1].
Original languageEnglish
Title of host publicationProceedings of the First International Workshop on FIB for Photonics
Subtitle of host publicationCollocated with the 14th European Conference on Integrated Optics (ECIO 2008), Eindhoven, the Netherlands, 13-14 June 2008
EditorsRené M. de Ridder, Feridun Ay, Lasse J. Kauppinen
Place of PublicationEnschede, The Netherlands
PublisherUniversity of Twente
Pages42-45
ISBN (Print)9789036526784
Publication statusPublished - Jun 2008
Event1st International Workshop on FIB for Photonics 2008 - Eindhoven, Netherlands
Duration: 13 Jun 200814 Jun 2008
Conference number: 1

Workshop

Workshop1st International Workshop on FIB for Photonics 2008
Country/TerritoryNetherlands
CityEindhoven
Period13/06/0814/06/08

Keywords

  • EC Grant Agreement nr.: FP6/004525

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