Focused ion beam nano-structuring of Al2O3 dielectric layers for photonic applications

F. Ay, J. Bradley, W.C.L. Hopman, V.J. Gadgil, R.M. de Ridder, Kerstin Worhoff, Markus Pollnau

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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    Abstract

    In order to enable full integration of active integrated optical components based on Si-technology, high quality micro- and nano-structuring processes aiming at the development of on-chip resonator structures are to be achieved. By optimizing focused ion beam milling parameters such as ion current, dwell time, loop repetitions, scanning strategy, and applying a top metal layer for reducing charging effects and improving sidewall definition, reflection gratings on $Al_2O_3$ channel waveguides with smooth and uniform sidewalls were successfully demonstrated.
    Original languageUndefined
    Title of host publicationBook of Abstracts 33rd International Conference on Micro- and Nano-Engineering 2007
    Place of PublicationCopenhagen, Denmark
    PublisherTechnical University of Denmark
    Pages627-628
    Number of pages2
    ISBN (Print)not assigned
    Publication statusPublished - Sep 2007
    Event33rd International Conference on Micro- and Nano-Engineering, MNE 2007 - Copenhagen, Denmark
    Duration: 23 Sep 200726 Sep 2007
    Conference number: 33

    Publication series

    Name
    PublisherTechnical University of Denmark

    Conference

    Conference33rd International Conference on Micro- and Nano-Engineering, MNE 2007
    Abbreviated titleMNE
    CountryDenmark
    CityCopenhagen
    Period23/09/0726/09/07

    Keywords

    • IOMS-APD: Active Photonic Devices
    • METIS-248718
    • IR-64432
    • EWI-11291

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