Focused ion beam nano-structuring of Al2O3 dielectric layers for photonic applications

F. Ay; J. Bradley; W.C.L. Hopman; V.J. Gadgil; R.M. de Ridder; Kerstin Worhoff; Markus Pollnau

Focused ion beam nano-structuring of Al₂O₃ dielectric layers for photonic applications

F. Ay, J. Bradley, W.C.L. Hopman, V.J. Gadgil, R.M. de Ridder, Kerstin Worhoff, Markus Pollnau

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

107 Downloads (Pure)

Abstract

In order to enable full integration of active integrated optical components based on Si-technology, high quality micro- and nano-structuring processes aiming at the development of on-chip resonator structures are to be achieved. By optimizing focused ion beam milling parameters such as ion current, dwell time, loop repetitions, scanning strategy, and applying a top metal layer for reducing charging effects and improving sidewall definition, reflection gratings on $Al_2O_3$ channel waveguides with smooth and uniform sidewalls were successfully demonstrated.

Original language	Undefined
Title of host publication	Book of Abstracts 33rd International Conference on Micro- and Nano-Engineering 2007
Place of Publication	Copenhagen, Denmark
Publisher	Technical University of Denmark
Pages	627-628
Number of pages	2
ISBN (Print)	not assigned
Publication status	Published - Sep 2007
Event	33rd International Conference on Micro- and Nano-Engineering, MNE 2007 - Copenhagen, Denmark Duration: 23 Sep 2007 → 26 Sep 2007 Conference number: 33

Publication series

Name
Publisher	Technical University of Denmark

Conference

Conference	33rd International Conference on Micro- and Nano-Engineering, MNE 2007
Abbreviated title	MNE
Country/Territory	Denmark
City	Copenhagen
Period	23/09/07 → 26/09/07

Keywords

IOMS-APD: Active Photonic Devices
METIS-248718
IR-64432
EWI-11291

Access to Document

Cite this

@inproceedings{20a97123fba440e8b9bfccd4a141eb49,

title = "Focused ion beam nano-structuring of Al2O3 dielectric layers for photonic applications",

abstract = "In order to enable full integration of active integrated optical components based on Si-technology, high quality micro- and nano-structuring processes aiming at the development of on-chip resonator structures are to be achieved. By optimizing focused ion beam milling parameters such as ion current, dwell time, loop repetitions, scanning strategy, and applying a top metal layer for reducing charging effects and improving sidewall definition, reflection gratings on $Al_2O_3$ channel waveguides with smooth and uniform sidewalls were successfully demonstrated.",

keywords = "IOMS-APD: Active Photonic Devices, METIS-248718, IR-64432, EWI-11291",

author = "F. Ay and J. Bradley and W.C.L. Hopman and V.J. Gadgil and {de Ridder}, R.M. and Kerstin Worhoff and Markus Pollnau",

year = "2007",

month = sep,

language = "Undefined",

isbn = "not assigned",

publisher = "Technical University of Denmark",

pages = "627--628",

booktitle = "Book of Abstracts 33rd International Conference on Micro- and Nano-Engineering 2007",

note = "null ; Conference date: 23-09-2007 Through 26-09-2007",

}

Ay, F, Bradley, J, Hopman, WCL, Gadgil, VJ, de Ridder, RM, Worhoff, K & Pollnau, M 2007, Focused ion beam nano-structuring of Al₂O₃ dielectric layers for photonic applications. in Book of Abstracts 33rd International Conference on Micro- and Nano-Engineering 2007. Technical University of Denmark, Copenhagen, Denmark, pp. 627-628, 33rd International Conference on Micro- and Nano-Engineering, MNE 2007, Copenhagen, Denmark, 23/09/07.

Focused ion beam nano-structuring of Al₂O₃ dielectric layers for photonic applications. / Ay, F.; Bradley, J.; Hopman, W.C.L. et al.

Book of Abstracts 33rd International Conference on Micro- and Nano-Engineering 2007. Copenhagen, Denmark : Technical University of Denmark, 2007. p. 627-628.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Focused ion beam nano-structuring of Al2O3 dielectric layers for photonic applications

AU - Ay, F.

AU - Bradley, J.

AU - Hopman, W.C.L.

AU - Gadgil, V.J.

AU - de Ridder, R.M.

AU - Worhoff, Kerstin

AU - Pollnau, Markus

N1 - Conference code: 33

PY - 2007/9

Y1 - 2007/9

N2 - In order to enable full integration of active integrated optical components based on Si-technology, high quality micro- and nano-structuring processes aiming at the development of on-chip resonator structures are to be achieved. By optimizing focused ion beam milling parameters such as ion current, dwell time, loop repetitions, scanning strategy, and applying a top metal layer for reducing charging effects and improving sidewall definition, reflection gratings on $Al_2O_3$ channel waveguides with smooth and uniform sidewalls were successfully demonstrated.

AB - In order to enable full integration of active integrated optical components based on Si-technology, high quality micro- and nano-structuring processes aiming at the development of on-chip resonator structures are to be achieved. By optimizing focused ion beam milling parameters such as ion current, dwell time, loop repetitions, scanning strategy, and applying a top metal layer for reducing charging effects and improving sidewall definition, reflection gratings on $Al_2O_3$ channel waveguides with smooth and uniform sidewalls were successfully demonstrated.

KW - IOMS-APD: Active Photonic Devices

KW - METIS-248718

KW - IR-64432

KW - EWI-11291

M3 - Conference contribution

SN - not assigned

SP - 627

EP - 628

BT - Book of Abstracts 33rd International Conference on Micro- and Nano-Engineering 2007

PB - Technical University of Denmark

CY - Copenhagen, Denmark

Y2 - 23 September 2007 through 26 September 2007

ER -