Focused-ion-beam nano-structuring of Al2O3 dielectric layers for photonic applications

F. Ay, Kerstin Worhoff, R.M. de Ridder, Markus Pollnau

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    14 Citations (Scopus)

    Abstract

    In this work, we report on utilization and optimization of the focused-ion-beam technique for the fabrication of nanostructures on Al2O3 waveguides for applications in integrated photonic devices. In particular, the investigation of the effects of parameters such as ion-beam current, dwell time, and scanning strategy is addressed. As a result of optimizing these parameters, excellent quality gratings with smooth and uniform sidewalls are reported. The effects of redeposition are minimized and good control of the nanostructuring process is reported. The effect of Ga+ ion implantation during the milling process on the optical performance of the devices is discussed.
    Original languageUndefined
    Pages (from-to)105008
    Number of pages5
    JournalJournal of micromechanics and microengineering
    Volume22
    Issue number10
    DOIs
    Publication statusPublished - Oct 2012

    Keywords

    • EWI-22180
    • IR-81257
    • METIS-287980
    • IOMS-APD: Active Photonic Devices

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