Focused ion beam nano-structuring of photonic Bragg gratings in Al2O3 waveguides

Amaia Uranga, F. Ay, J. Bradley, R.M. de Ridder, Kerstin Worhoff, Markus Pollnau

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    Focused ion beam (FIB) etching is receiving increasing attention for the fabrication of active integrated optical components such as waveguide amplifiers and lasers. Si-technology compatible low-loss $Al_2O_3$ channel waveguides grown on thermally oxidized silicon substrates have been reported recently. We used FIB milling for reflection grating definition on Al2O3 channel and ridge waveguides. Structural optimization has been achieved by experimentally adjusting FIB patterning parameters such as ion current, dwell time, loop repetitions, scanning strategy, and applying a top metal layer for reducing charging effects and sidewall definition improvement. Optical properties of these devices are currently being studied.
    Original languageUndefined
    Title of host publication12th Annual Symposium IEEE/LEOS Benelux
    EditorsPh. Emplit, M. Delqué, S.-P. Gorza, P. Kockaart, X Leijtens
    Place of PublicationBrussels, Belgium
    PublisherIEEE/LEOS Benelux Chapter
    Number of pages4
    ISBN (Print)978-2-9600753-0-4
    Publication statusPublished - 17 Dec 2007
    Event12th Annual Symposium IEEE/LEOS Benelux Chapter 2007 - Brussels, Belgium, Brussels, Belgium
    Duration: 17 Dec 200718 Dec 2007

    Publication series

    PublisherIEEE LEOS Benelux Chapter


    Conference12th Annual Symposium IEEE/LEOS Benelux Chapter 2007
    Other17-18 Dec 2007


    • IOMS-APD: Active Photonic Devices
    • EWI-11861
    • IR-64610
    • METIS-245995
    • EC Grant Agreement nr.: FP6/017501

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