Abstract
We report our recent results on utilization and optimization of the focused ion beam technique for the fabrication of grating structures for potential integrated photonic devices in crystalline KY(WO4)2:Yb3+. The FIB milling procedure for the realization of grating structures in KYW channel waveguides was optimized. Grating structures more than 4 µm in depth with an improved total sidewall angle of 4.3 were achieved by varying dwell time and pixel resolution distribution. Currently optical characterization of the resonator structures for achieving on-chip waveguide lasers is ongoing.
Original language | Undefined |
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Title of host publication | Proceedings of the 2010 Annual Symposium of the IEEE Photonics Benelux Chapter |
Editors | J. Pozo, M. Mortensen, P. Urbach, X Leijtens, M. Yousefi |
Place of Publication | Delft |
Publisher | Uitgeverij TNO |
Pages | 265-268 |
Number of pages | 4 |
ISBN (Print) | 978-90-78314-15-8 |
Publication status | Published - 19 Nov 2010 |
Event | 15th Annual Symposium of the IEEE Photonics Benelux Chapter 2010 - Delft, Netherlands Duration: 18 Nov 2010 → 19 Nov 2010 Conference number: 15 |
Publication series
Name | |
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Publisher | Uitgeverij TNO |
Conference
Conference | 15th Annual Symposium of the IEEE Photonics Benelux Chapter 2010 |
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Country/Territory | Netherlands |
City | Delft |
Period | 18/11/10 → 19/11/10 |
Keywords
- IR-75722
- EWI-19306
- IOMS-APD: Active Photonic Devices
- METIS-276752