Abstract
We report our recent results on utilization and optimization of the focused ion beam technique for the fabrication of grating structures for potential integrated photonic devices in crystalline KY(WO4)2:Yb3+. The FIB milling procedure for the realization of grating structures in KYW channel waveguides was optimized. Grating structures more than 4 µm in depth with an improved total sidewall angle of 4.3 were achieved by varying dwell time and pixel resolution distribution. Currently optical characterization of the resonator structures for achieving on-chip waveguide lasers is ongoing.
| Original language | Undefined |
|---|---|
| Title of host publication | Proceedings of the 2010 Annual Symposium of the IEEE Photonics Benelux Chapter |
| Editors | J. Pozo, M. Mortensen, P. Urbach, X Leijtens, M. Yousefi |
| Place of Publication | Delft |
| Publisher | Uitgeverij TNO |
| Pages | 265-268 |
| Number of pages | 4 |
| ISBN (Print) | 978-90-78314-15-8 |
| Publication status | Published - 19 Nov 2010 |
| Event | 15th Annual Symposium of the IEEE Photonics Benelux Chapter 2010 - Delft, Netherlands Duration: 18 Nov 2010 → 19 Nov 2010 Conference number: 15 |
Publication series
| Name | |
|---|---|
| Publisher | Uitgeverij TNO |
Conference
| Conference | 15th Annual Symposium of the IEEE Photonics Benelux Chapter 2010 |
|---|---|
| Country/Territory | Netherlands |
| City | Delft |
| Period | 18/11/10 → 19/11/10 |
Keywords
- IR-75722
- EWI-19306
- IOMS-APD: Active Photonic Devices
- METIS-276752
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