Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

J.Y. Cheng; C.A. Ross; V.Z.H. Chan; E.L. Thomas; Rob G.H. Lammertink; Gyula J. Vancso

doi:10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q

Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

J.Y. Cheng, C.A. Ross, V.Z.H. Chan, E.L. Thomas, Rob G.H. Lammertink, Gyula J. Vancso

Research output: Contribution to journal › Article › Academic › peer-review

660 Citations (Scopus)

Abstract

Single-domain cobalt dot arrayswith high magnetic particle density, patterned over large areas (e.g., 10 cm diameter wafers) are fabricated by self-assembled block copolymer lithography, using a polystyrene-poly(ferrocenyldimethylsilane) copolymer as a template. By varying the copolymer type and etching conditions the magnetic properties can be tuned. The Figure shows a typical array of Co dots with tungsten caps obtained via this procedure.

Original language	Undefined
Pages (from-to)	1174-1178
Number of pages	5
Journal	Advanced materials
Volume	13
Issue number	15
DOIs	https://doi.org/10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q
Publication status	Published - 2001

Keywords

Block copolymer lithography self-assembled
IR-71677
Magnetic
METIS-204611
Etching
Cobalt dot arrays single domain

Access to Document

10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q

Cite this

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title = "Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography",

abstract = "Single-domain cobalt dot arrayswith high magnetic particle density, patterned over large areas (e.g., 10 cm diameter wafers) are fabricated by self-assembled block copolymer lithography, using a polystyrene-poly(ferrocenyldimethylsilane) copolymer as a template. By varying the copolymer type and etching conditions the magnetic properties can be tuned. The Figure shows a typical array of Co dots with tungsten caps obtained via this procedure.",

keywords = "Block copolymer lithography self-assembled, IR-71677, Magnetic, METIS-204611, Etching, Cobalt dot arrays single domain",

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T1 - Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

AU - Cheng, J.Y.

AU - Ross, C.A.

AU - Chan, V.Z.H.

AU - Thomas, E.L.

AU - Lammertink, Rob G.H.

AU - Vancso, Gyula J.

PY - 2001

Y1 - 2001

N2 - Single-domain cobalt dot arrayswith high magnetic particle density, patterned over large areas (e.g., 10 cm diameter wafers) are fabricated by self-assembled block copolymer lithography, using a polystyrene-poly(ferrocenyldimethylsilane) copolymer as a template. By varying the copolymer type and etching conditions the magnetic properties can be tuned. The Figure shows a typical array of Co dots with tungsten caps obtained via this procedure.

AB - Single-domain cobalt dot arrayswith high magnetic particle density, patterned over large areas (e.g., 10 cm diameter wafers) are fabricated by self-assembled block copolymer lithography, using a polystyrene-poly(ferrocenyldimethylsilane) copolymer as a template. By varying the copolymer type and etching conditions the magnetic properties can be tuned. The Figure shows a typical array of Co dots with tungsten caps obtained via this procedure.

KW - Block copolymer lithography self-assembled

KW - IR-71677

KW - Magnetic

KW - METIS-204611

KW - Etching

KW - Cobalt dot arrays single domain

U2 - 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q

DO - 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q

M3 - Article

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EP - 1178

JO - Advanced materials

JF - Advanced materials

SN - 0935-9648

IS - 15

ER -