Single-domain cobalt dot arrayswith high magnetic particle density, patterned over large areas (e.g., 10 cm diameter wafers) are fabricated by self-assembled block copolymer lithography, using a polystyrene-poly(ferrocenyldimethylsilane) copolymer as a template. By varying the copolymer type and etching conditions the magnetic properties can be tuned. The Figure shows a typical array of Co dots with tungsten caps obtained via this procedure.
|Number of pages||5|
|Publication status||Published - 2001|
- Block copolymer lithography self-assembled
- Cobalt dot arrays single domain