Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

J.Y. Cheng, C.A. Ross, V.Z.H. Chan, E.L. Thomas, Rob G.H. Lammertink, Gyula J. Vancso

Research output: Contribution to journalArticleAcademicpeer-review

645 Citations (Scopus)

Abstract

Single-domain cobalt dot arrayswith high magnetic particle density, patterned over large areas (e.g., 10 cm diameter wafers) are fabricated by self-assembled block copolymer lithography, using a polystyrene-poly(ferrocenyldimethylsilane) copolymer as a template. By varying the copolymer type and etching conditions the magnetic properties can be tuned. The Figure shows a typical array of Co dots with tungsten caps obtained via this procedure.
Original languageUndefined
Pages (from-to)1174-1178
Number of pages5
JournalAdvanced materials
Volume13
Issue number15
DOIs
Publication statusPublished - 2001

Keywords

  • Block copolymer lithography self-assembled
  • IR-71677
  • Magnetic
  • METIS-204611
  • Etching
  • Cobalt dot arrays single domain

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