Formation of Source and Drain Regions for a-Si: H TFT by Using Ion Implantation Through Metal Technique

Van Hieu Nguyen, A.R. Merticaru, R. Dekker, H. van Kranenburg, A.J. Mouthaan, N.D. Chien

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationMierlo, The Netherlands
    Publication statusPublished - 24 Nov 1999


    • METIS-114850

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