Formation of Source and Drain Regions for a-Si: H TFT by Using Ion Implantation Through Metal Technique

Van Hieu Nguyen, A.R. Merticaru, R. Dekker, H. van Kranenburg, A.J. Mouthaan, N.D. Chien

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationMierlo, The Netherlands
    Publication statusPublished - 24 Nov 1999

    Keywords

    • METIS-114850

    Cite this

    Nguyen, V. H., Merticaru, A. R., Dekker, R., van Kranenburg, H., Mouthaan, A. J., & Chien, N. D. (1999, Nov 24). Formation of Source and Drain Regions for a-Si: H TFT by Using Ion Implantation Through Metal Technique. Mierlo, The Netherlands.
    Nguyen, Van Hieu ; Merticaru, A.R. ; Dekker, R. ; van Kranenburg, H. ; Mouthaan, A.J. ; Chien, N.D. / Formation of Source and Drain Regions for a-Si: H TFT by Using Ion Implantation Through Metal Technique. 1999. Mierlo, The Netherlands.
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    title = "Formation of Source and Drain Regions for a-Si: H TFT by Using Ion Implantation Through Metal Technique",
    keywords = "METIS-114850",
    author = "Nguyen, {Van Hieu} and A.R. Merticaru and R. Dekker and {van Kranenburg}, H. and A.J. Mouthaan and N.D. Chien",
    year = "1999",
    month = "11",
    day = "24",
    language = "Undefined",
    type = "Other",

    }

    Nguyen, VH, Merticaru, AR, Dekker, R, van Kranenburg, H, Mouthaan, AJ & Chien, ND 1999, Formation of Source and Drain Regions for a-Si: H TFT by Using Ion Implantation Through Metal Technique. Mierlo, The Netherlands.

    Formation of Source and Drain Regions for a-Si: H TFT by Using Ion Implantation Through Metal Technique. / Nguyen, Van Hieu; Merticaru, A.R.; Dekker, R.; van Kranenburg, H.; Mouthaan, A.J.; Chien, N.D.

    Mierlo, The Netherlands. 1999, .

    Research output: Other contributionOther research output

    TY - GEN

    T1 - Formation of Source and Drain Regions for a-Si: H TFT by Using Ion Implantation Through Metal Technique

    AU - Nguyen, Van Hieu

    AU - Merticaru, A.R.

    AU - Dekker, R.

    AU - van Kranenburg, H.

    AU - Mouthaan, A.J.

    AU - Chien, N.D.

    PY - 1999/11/24

    Y1 - 1999/11/24

    KW - METIS-114850

    M3 - Other contribution

    CY - Mierlo, The Netherlands

    ER -

    Nguyen VH, Merticaru AR, Dekker R, van Kranenburg H, Mouthaan AJ, Chien ND. Formation of Source and Drain Regions for a-Si: H TFT by Using Ion Implantation Through Metal Technique. 1999.