Formation of thin oxide films by metal-organic chemical vapour deposition

V.A.C. Haanappel, H.D. van Corbach, R. Hofman, R.W.J. Morsinkhof, T. Fransen, P.J. Gellings

Research output: Contribution to journal › Article › Academic

Original language	Undefined
Pages (from-to)	245-262
Number of pages	18
Journal	High temperature materials and processes
Volume	15
Issue number	4
Publication status	Published - 1996

Keywords

@article{72adc88b11d3443b868a12ba4320d096,

title = "Formation of thin oxide films by metal-organic chemical vapour deposition",

keywords = "METIS-105520",

author = "V.A.C. Haanappel and {van Corbach}, H.D. and R. Hofman and R.W.J. Morsinkhof and T. Fransen and P.J. Gellings",

year = "1996",

language = "Undefined",

volume = "15",

pages = "245--262",

journal = "High temperature materials and processes",

issn = "0334-6455",

publisher = "Walter De Gruyter",

number = "4",

}

TY - JOUR

T1 - Formation of thin oxide films by metal-organic chemical vapour deposition

AU - Haanappel, V.A.C.

AU - van Corbach, H.D.

AU - Hofman, R.

AU - Morsinkhof, R.W.J.

AU - Fransen, T.

AU - Gellings, P.J.

PY - 1996

Y1 - 1996

KW - METIS-105520

M3 - Article

VL - 15

SP - 245

EP - 262

JO - High temperature materials and processes

JF - High temperature materials and processes

SN - 0334-6455

IS - 4

ER -