Formation of thin oxide films by metal-organic chemical vapour deposition

V.A.C. Haanappel, H.D. van Corbach, R. Hofman, R.W.J. Morsinkhof, T. Fransen, P.J. Gellings

Research output: Contribution to journal › Article › Academic

13 Citations (Scopus)

Original language	Undefined
Pages (from-to)	245-262
Number of pages	18
Journal	High temperature materials and processes
Volume	15
Issue number	4
Publication status	Published - 1996

Cite this

Haanappel, V. A. C., van Corbach, H. D., Hofman, R., Morsinkhof, R. W. J., Fransen, T., & Gellings, P. J. (1996). Formation of thin oxide films by metal-organic chemical vapour deposition. High temperature materials and processes, 15(4), 245-262.

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journal = "High temperature materials and processes",

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publisher = "Walter De Gruyter",

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TY - JOUR

T1 - Formation of thin oxide films by metal-organic chemical vapour deposition

AU - Haanappel, V.A.C.

AU - van Corbach, H.D.

AU - Hofman, R.

AU - Morsinkhof, R.W.J.

AU - Fransen, T.

AU - Gellings, P.J.

PY - 1996

Y1 - 1996

KW - METIS-105520

M3 - Article

VL - 15

SP - 245

EP - 262

JO - High temperature materials and processes

JF - High temperature materials and processes

SN - 0334-6455

IS - 4

ER -