TY - JOUR
T1 - Formation of thin oxide films by metal-organic chemical vapour deposition
AU - Haanappel, V.A.C.
AU - van Corbach, H.D.
AU - Hofman, R.
AU - Morssinkhof, R.W.J.
AU - Fransen, T.
AU - Gellings, P.J.
PY - 1996
Y1 - 1996
N2 - A summary is given of the metal-organic vapour deposition, performed during the last eight years at the University of Twente (The Netherlands), of thin alumina, silica, and titania films at atmospheric and at low pressure on stainless steels. Alumina films were produced from aluminium-tri-sec-butoxide (ATSB) and aluminium-tri-iso-propoxide (ATI), silica films from di-acetoxy-di-t-butoxy-silane (DADBS), and titania films from titanium-tetra-iso-propoxide (TTIP). These investigations can be separated into a number of projects: 1) mechanistic aspects of the decomposition chemistry of the precursors, 2) kinetics of the deposition processes, 3) chemical properties, and 4) mechanical properties of the thin oxide films.
AB - A summary is given of the metal-organic vapour deposition, performed during the last eight years at the University of Twente (The Netherlands), of thin alumina, silica, and titania films at atmospheric and at low pressure on stainless steels. Alumina films were produced from aluminium-tri-sec-butoxide (ATSB) and aluminium-tri-iso-propoxide (ATI), silica films from di-acetoxy-di-t-butoxy-silane (DADBS), and titania films from titanium-tetra-iso-propoxide (TTIP). These investigations can be separated into a number of projects: 1) mechanistic aspects of the decomposition chemistry of the precursors, 2) kinetics of the deposition processes, 3) chemical properties, and 4) mechanical properties of the thin oxide films.
U2 - 10.1515/HTMP.1996.15.4.245
DO - 10.1515/HTMP.1996.15.4.245
M3 - Article
SN - 0334-6455
VL - 15
SP - 245
EP - 262
JO - High temperature materials and processes
JF - High temperature materials and processes
IS - 4
ER -