Furnace and Rapid Thermal crystallization of amorphous Si and GexSi1-x for thin film transistors

J.B. Rem, M.C.V. de Leuw, J. Holleman, J.F. Verweij

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationStrasbourg, France
    Publication statusPublished - 4 Jun 1996

    Keywords

    • METIS-114910

    Cite this