Abstract
Ramp-type Josephson junctions with highly doped PrBa2Cu3-xGaxO7-δ barrier layers (x=0.7, 1.0) have been investigated by high-resolution electron microscopy. A Ga-rich intergrowth and Ga diffusion in the ion-milled SrTiO3 substrate are observed. The Ga segregation is responsible for the deviating electrical behavior as expected from extrapolation of low doping levels (x=0.1-0.4). The Ga diffusion in the ion-milled substrate, and possibly in the base electrode, may hamper Josephson junction fabrication using substituted REBa2Cu3O7-δ materials (RE=rare earth)
| Original language | English |
|---|---|
| Pages (from-to) | 1167-1169 |
| Number of pages | 3 |
| Journal | Applied physics letters |
| Volume | 70 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 1997 |
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