Skip to main navigation Skip to search Skip to main content

Ga segregation in DyBa2Cu3O7-δ/PrBa2Cu3-xGaO7-δ/DyBa2Cu3O7-δ ramp-type Josephson junctions

  • K. Verbist
  • , O.I. Lebedev
  • , G. van Tendeloo
  • , M.A.J. Verhoeven
  • , A.J.H.M. Rijnders
  • , D.H.A. Blank
  • , H. Rogalla

Research output: Contribution to journalArticleAcademicpeer-review

171 Downloads (Pure)

Abstract

Ramp-type Josephson junctions with highly doped PrBa2Cu3-xGaxO7-δ barrier layers (x=0.7, 1.0) have been investigated by high-resolution electron microscopy. A Ga-rich intergrowth and Ga diffusion in the ion-milled SrTiO3 substrate are observed. The Ga segregation is responsible for the deviating electrical behavior as expected from extrapolation of low doping levels (x=0.1-0.4). The Ga diffusion in the ion-milled substrate, and possibly in the base electrode, may hamper Josephson junction fabrication using substituted REBa2Cu3O7-δ materials (RE=rare earth)
Original languageEnglish
Pages (from-to)1167-1169
Number of pages3
JournalApplied physics letters
Volume70
Issue number9
DOIs
Publication statusPublished - 1997

Fingerprint

Dive into the research topics of 'Ga segregation in DyBa2Cu3O7-δ/PrBa2Cu3-xGaO7-δ/DyBa2Cu3O7-δ ramp-type Josephson junctions'. Together they form a unique fingerprint.

Cite this