Abstract
The world record efficiency and open circuit voltage for crystalline silicon solar cells are held by a-Si/Si heterojunction devices. While a-Si provides excellent surface passivation, these heterojunction devices are limited by non-ideal optical and electronic properties. Gallium phosphide is a candidate material for replacing a-Si in a heterojunction device, promising lower parasitic absorption and better carrier mobilities. In this work, we present our results in growing high quality GaP thin films directly on Si using a two-step nucleation and growth scheme with metalorganic chemical vapor deposition, characterization, and x-ray photoelectron spectroscopy band offset measurements toward realizing a GaP/Si heterojunction device.
Original language | English |
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Title of host publication | 2015 IEEE 42nd Photovoltaic Specialist Conference, PVSC 2015 |
Publisher | IEEE |
ISBN (Electronic) | 9781479979448 |
DOIs | |
Publication status | Published - 14 Dec 2015 |
Externally published | Yes |
Event | 42nd IEEE Photovoltaic Specialists Conference, PVSC 2015 - Hyatt Regency New Orleans, New Orleans, United States Duration: 14 Jun 2015 → 19 Jun 2015 Conference number: 42 http://www.ieee-pvsc.org/PVSC42/ |
Publication series
Name | 2015 IEEE 42nd Photovoltaic Specialist Conference, PVSC 2015 |
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Conference
Conference | 42nd IEEE Photovoltaic Specialists Conference, PVSC 2015 |
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Abbreviated title | PVSC |
Country/Territory | United States |
City | New Orleans |
Period | 14/06/15 → 19/06/15 |
Internet address |
Keywords
- gallium phosphide
- heterojunctions
- photovoltaic cells
- silicon