Gate oxide reliability and deuterated CMOS processing

A.J. Hof, A. Kovalgin, R. van Schaijk, W.M. Baks, J. Schmitz

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    1 Citation (Scopus)
    112 Downloads (Pure)

    Fingerprint

    Dive into the research topics of 'Gate oxide reliability and deuterated CMOS processing'. Together they form a unique fingerprint.

    Business & Economics