| Original language | English |
|---|---|
| Place of Publication | Enschede, the Netherlands |
| Publication status | Published - 23 Jun 1998 |
Keywords
- METIS-114924
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Gate oxide reliability for deep submicron PMOS Si and GeSi gate technologies
- C. Salm
- , J.H. Klootwijk
- , Y.V. Ponomarev
- , P.W.M. Boos
- , D.J. Gravesteijn
Research output: Other contribution › Other research output