Gate Oxide Reliabily for Deep Submicron PMOS Si and GeSi Gate Technologies

C. Salm, J.H. Klootwijk, Y.V. Ponomarev, P.W.M. Boos, D.J. Gravesteijn, P.H. Woerlee

Research output: Other contribution › Other research output

Keywords

@misc{cae386842a884053a7b0bb0642093ffa,

title = "Gate Oxide Reliabily for Deep Submicron PMOS Si and GeSi Gate Technologies",

keywords = "METIS-114892",

author = "C. Salm and J.H. Klootwijk and Y.V. Ponomarev and P.W.M. Boos and D.J. Gravesteijn and P.H. Woerlee",

year = "1998",

month = nov,

day = "26",

language = "English",

type = "Other",

}