Gate-workfunction engineering using poly-(Si,Ge) for high-performance 0.18 μm CMOS technology

Y. V. Ponomarev*, C. Salm, J. Schmitz, P. H. Woerlee, P. A. Stolk, D. J. Gravesteijn

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

33 Citations (Scopus)
300 Downloads (Pure)

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