GISAXS analysis of “delayed nitridation” 6.x nm multilayers

Dmitry Kuznetsov, Andrey Yakshin, Igor Alexandrovich Makhotkin, Frederik Bijkerk, N. Mukharamova, S.N. Yakunin, I.A. Subbotin

Research output: Contribution to conferencePosterOther research output

Abstract

Object: La/B-based multilayersApplications: EUV lithography, X-ray fluorescenceanalysis, space research, high-intensity freeelectronlasers.Our reflectance world record [1]: 64.1% at 1.5 offnormalAOI, λ=6.65 nmApplication-desired reflectance: ~70.0%Purpose: Investigation of roughness influence on R
Original languageEnglish
Pages-
Publication statusPublished - 1 Oct 2015
EventX-Ray Metrology Workshop 2015 - University of Twente, Enschede, Netherlands
Duration: 1 Oct 20152 Oct 2015

Conference

ConferenceX-Ray Metrology Workshop 2015
CountryNetherlands
CityEnschede
Period1/10/152/10/15

Keywords

  • METIS-311895

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