GISAXS analysis of “delayed nitridation” 6.x nm multilayers

Dmitry Kuznetsov; Andrey Yakshin; Igor Alexandrovich Makhotkin; Frederik Bijkerk; N. Mukharamova; S.N. Yakunin; I.A. Subbotin

GISAXS analysis of “delayed nitridation” 6.x nm multilayers

Dmitry Kuznetsov, Andrey Yakshin, Igor Alexandrovich Makhotkin, Frederik Bijkerk, N. Mukharamova, S.N. Yakunin, I.A. Subbotin

XUV Optics

Research output: Contribution to conference › Poster › Other research output

Abstract

Object: La/B-based multilayersApplications: EUV lithography, X-ray fluorescenceanalysis, space research, high-intensity freeelectronlasers.Our reflectance world record [1]: 64.1% at 1.5 offnormalAOI, λ=6.65 nmApplication-desired reflectance: ~70.0%Purpose: Investigation of roughness influence on R

Original language	English
Pages	-
Publication status	Published - 1 Oct 2015
Event	X-Ray Metrology Workshop 2015 - University of Twente, Enschede, Netherlands Duration: 1 Oct 2015 → 2 Oct 2015

Conference

Conference	X-Ray Metrology Workshop 2015
Country/Territory	Netherlands
City	Enschede
Period	1/10/15 → 2/10/15

Keywords

METIS-311895

Access to Document

https://www.utwente.nl/mesaplus/xuv/xrayworkshop/

Cite this

@conference{5ab37e52c12f4bb39aa7754649c03416,

title = "GISAXS analysis of “delayed nitridation” 6.x nm multilayers",

abstract = "Object: La/B-based multilayersApplications: EUV lithography, X-ray fluorescenceanalysis, space research, high-intensity freeelectronlasers.Our reflectance world record [1]: 64.1\% at 1.5 offnormalAOI, λ=6.65 nmApplication-desired reflectance: \textasciitilde{}70.0\%Purpose: Investigation of roughness influence on R",

keywords = "METIS-311895",

author = "Dmitry Kuznetsov and Andrey Yakshin and Makhotkin, \{Igor Alexandrovich\} and Frederik Bijkerk and N. Mukharamova and S.N. Yakunin and I.A. Subbotin",

year = "2015",

month = oct,

day = "1",

language = "English",

pages = "--",

note = "X-Ray Metrology Workshop 2015 ; Conference date: 01-10-2015 Through 02-10-2015",

}

TY - CONF

T1 - GISAXS analysis of “delayed nitridation” 6.x nm multilayers

AU - Kuznetsov, Dmitry

AU - Yakshin, Andrey

AU - Makhotkin, Igor Alexandrovich

AU - Bijkerk, Frederik

AU - Mukharamova, N.

AU - Yakunin, S.N.

AU - Subbotin, I.A.

PY - 2015/10/1

Y1 - 2015/10/1

N2 - Object: La/B-based multilayersApplications: EUV lithography, X-ray fluorescenceanalysis, space research, high-intensity freeelectronlasers.Our reflectance world record [1]: 64.1% at 1.5 offnormalAOI, λ=6.65 nmApplication-desired reflectance: ~70.0%Purpose: Investigation of roughness influence on R

AB - Object: La/B-based multilayersApplications: EUV lithography, X-ray fluorescenceanalysis, space research, high-intensity freeelectronlasers.Our reflectance world record [1]: 64.1% at 1.5 offnormalAOI, λ=6.65 nmApplication-desired reflectance: ~70.0%Purpose: Investigation of roughness influence on R

KW - METIS-311895

M3 - Poster

SP - -

T2 - X-Ray Metrology Workshop 2015

Y2 - 1 October 2015 through 2 October 2015

ER -

GISAXS analysis of “delayed nitridation” 6.x nm multilayers

Abstract

Conference

Keywords

Access to Document

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Cite this